Method of manufacturing electron-emitting device, electron source and image-forming apparatus
AssigneeCanon Kabushiki Kaisha
InventorsTakashi Noma, Seijiro Kato, Fumio Kishi, Hisaaki Kawade, Toshikazu Ohnishi, Michiyo Nishimura, Kumiko Uno, Takahiro Horiguchi, Masato Yamanobe
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Abstract
An electron-emitting device comprising a pair of device electrodes and an electroconductive film including an electron-emitting region is manufactured by a method comprising a process of forming an electroconductive film including steps of forming a pattern on a thin film containing a metal element on the basis of a difference of chemical state, and removing part of the thin film on the basis of the difference of chemical state.
Claims54
A method of manufacturing an electron-emitting device comprising a pair of device electrodes and an electroconductive film including an electron-emitting region, characterized in that said method comprises a process of forming an electroconductive film including steps of:
- forming a pattern on a thin film containing a metal element on the basis of a difference of chemical state;
- and
- removing part of the thin film on the basis of the difference of chemical state.
Dependencies are inferred from the claim text.