Compounds useful as chemical precursors in chemical vapor deposition of silicon-based ceramic materials
AssigneeEnichem S.p.A.
InventorsRichard Cruse, Veronika Szalai, Terence Clark, Stephen Rohman, Robert Mininni
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Abstract
In order to reduce the rate of coke formation during the industrial pyrolysis of hydrocarbons, the interior surface of a reactor is coated with a thin layer of a ceramic material, the layer being deposited by thermal decomposition of a non-oxygen containing silicon-nitrogen precursor in the vapor phase, tin an inert or reducing gas atmosphere in order to minimize the formation of oxide ceramics.
Claims14
A compound having the structure ##STR7## wherein R.sub.6 is hydrogen or C.sub.1-20 alkyl, R.sub.7 is hydrogen, Li or SiR.sub.8 R.sub.9 R.sub.10 where R.sub.8, R.sub.9, and R.sub.10 are, independently, hydrogen or C.sub.1-20 alkyl, and R.sub.11 is hydrogen or C.sub.1-20 alkyl;
- or
- a compound having the structure ##STR8## wherein R.sub.6 and R.sub.12 are, independently, hydrogen or C.sub.1-20 alkyl;
- or
- a compound having the structure ##STR9##
A compound selected from the group consisting of heptamethyl-chloro-trisilazane, 1,2,3-trichloro-hexamethyl trisilazane, ethyl-heptamethyl trisilazane, chloro-octamethyl trisilazane, N-lithio-1,3-dichloro-tetramethyl disilazane, 1,2,3-trichloro-hexamethyl trisilazane, 1,1-dichloro-1-ethyl-trimethyl disilazane, N-dimethylsilyl-1,1,3,3,5,5-hexamethyl-cyclotrisilazane;
- bis(N-dimethylsilyl)-1,1,3,3,5,5-hexamethyl-cyclotrisilazane;
- tris(N-dimethylsilyl)-1,1,3,3,5,5-hexamethylcyclotrisilazane;
- and N-lithio-1,1,3,3,5,5-hexamethylcyclotrisilazane.
A volitile CVD precursor compound having the structure ##STR12## wherein each R is, independently, hydrogen, C.sub.2-20 alkyl, or NR.sub.1 R.sub.2 wherein R.sub.1 and R.sub.2 are, independently, C.sub.1-20 alkyl, halogen or SiR.sub.3 R.sub.4 R.sub.5 wherein R.sub.3, R.sub.4 and R.sub.5 are hydrogen, C.sub.1-20 alkyl or NR.sub.1 R.sub.2, and A is a divalent C.sub.3+ -alkylene arylene or alkylarylene group.
The compound having the structure ##STR13##
Dependencies are inferred from the claim text.