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US 5,609,925 AGranted
Curing hydrogen silsesquioxane resin with an electron beam
AssigneesDow Corning Corporation, National Semiconductor Corporation
InventorsRobert C. Camilletti, Irfan Saadat, Michael Thomas
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Abstract
A low temperature method of forming silica-containing ceramic coatings on substrates in which a coating containing hydrogen silsesquioxane resin is applied on a substrate and exposed to an electron beam for a time sufficient to convert the hydrogen silsesquioxane resin to the silica-containing ceramic coating. This method is especially valuable for forming protective and dielectric coatings on electronic devices.
Claims10
A method of forming a silica-containing ceramic coating on a substrate comprising:
- applying a coating comprising hydrogen silsesquioxane resin on a substrate;
- and
- exposing the coated substrate to an electron beam for a time and at a dose effective to convert the hydrogen silsesquioxane resin coating to a silica-containing ceramic coating.
Dependencies are inferred from the claim text.