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US 5,608,943 AGranted
Apparatus for removing process liquid
AssigneeTokyo Electron Limited
InventorsNobuo Konishi, Kenji Sekiguchi
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AssigneeTokyo Electron Limited
InventorsNobuo Konishi, Kenji Sekiguchi
Estimating the term…
A resist processing apparatus has a washing nozzle inclined outward at a predetermined angle, for jetting a washing liquid to a vicinity of the undersurface of the peripheral portion of an article to be processed, and a collecting device for collecting the washing liquid from a portion above the article. The washing liquid is supplied by the force of the jet and the centrifugal force of the washing liquid from the washing nozzle to the undersurface of the article to remove coated films formed on the peripheral portion of the undersurface of the article. The washing liquid further reaches the upper surface of the article through the peripheral edge of the article. The width of the coated films to be removed is adjusted by properly regulating the amount of flow and the sucked amount of the washing liquid determined by its viscosity. The unnecessary coated films not only on the upper surface and the undersurface of the article but also on the vertical edge of the peripheral portion of the article are removed by supplying the washing liquid from the washing nozzle provided under the undersurface of the article.
An apparatus for an article having a processing liquid thereon comprising:
An apparatus for removing a part of a processing liquid layer attached to a peripheral portion of an upper surface, a peripheral edge, and a peripheral portion of an undersurface of a circular substrate having a substantially circular edge and a cutout linear edge comprising:
An apparatus for removing a part of a processing liquid layer attached to a peripheral portion of an upper surface, a peripheral edge, and a peripheral portion of an undersurface of an article comprising:
Dependencies are inferred from the claim text.