Antireflective coating for microlithography
AssigneeInternational Business Machines Corporation
InventorsJames T. Fahey, Brian W. Herbst, Leo L. Linehan, Wayne M. Moreau, Gary T. Spinillo, Kevin M. Welsh, Robert L. Wood
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Abstract
A co-polymer of benzophenone and bisphenol A has been shown to have DUV absorption properties. Therefore, the co-polymer has particular utility as an antireflective coating in microlithography applications. Incorporating anthracene into the co-polymer backbone enhances absorption at 248 nm. The endcapper used for the co-polymer can vary widely depending on the needs of the user and can be selected to promote adhesion, stability, and absorption of different wavelengths.
Claims2
An antireflective coating composition, in admixture:
- up to 25 weight percent of a co-polymer comprised of bisphenol A monomers, benzophenone monomers, and anthracene containing monomers;
- and
- at least 75 weight percent of a carrier fluid or solvent for said co-polymer.
Dependencies are inferred from the claim text.