Method of using precision burners for oxidizing halide-free, silicon-containing compounds
AssigneeCorning Incorporated
InventorsMichael B. Cain, Robert B. Desorice, William J. Kiefer, Dale R. Powers
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AssigneeCorning Incorporated
InventorsMichael B. Cain, Robert B. Desorice, William J. Kiefer, Dale R. Powers
Estimating the term…
A precision burner for oxidizing halide-free, silicon-containing compounds, such as, octamethyl-cyclotetrasiloxane (OMCTS), is provided. The burner includes a subassembly (13) which can be precisely mounted on a burner mounting block (107) through the use of an alignment stub (158), a raised face (162) on the burner mounting block (107), and a recess (160) in the back of the subassembly (13). The burner's face includes four concentric gas-emitting regions: a first central region (36, 90) from which exits a mixture of OMCTS and O.sub.2, a second innershield region (38, 92) from which exits N.sub.2, a third outershield region (40, 42, 94, 96) from which exits O.sub.2, and a fourth premix region (44, 98) from which exits a mixture of CH.sub.4 and O.sub.2. The burner provides more efficient utilization of halide-free, silicon-containing raw materials than prior burners.
A method of forming a silicon dioxide containing preform comprising the steps of:
Dependencies are inferred from the claim text.