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US 5,593,926 AGranted
Method of manufacturing semiconductor device
AssigneeSumitomo Electric Industries, Ltd.
InventorMitsuaki Fujihira
Life of this patent
Estimating the term…
Abstract
A method of manufacturing a semiconductor device having a package including a base, and a chip mounted on the base, wherein the chip has a surface on which an element is formed, the method comprising the steps of (a) fixing the chip having a protective coat formed on the surface to the base; and (b) removing the protective coat from the chip without touching the chip.
Claims8
A method for manufacturing a semiconductor device, comprising the steps of:
- (a) forming first, second, and third wiring layers on a surface of a wafer, wherein said third wiring layer is arranged between said first and said second wiring layers;
- (b) coating surfaces of said first, second, and third wiring layers and a remaining exposed surface of said wafer with a resist;
- (c) partially removing said resist to expose a part of the surfaces of said first and second wiring layers;
- (d) coating said exposed surfaces of said first and second wiring layers, and a surface of said resist, with a fourth wiring layer to connect said first wiring layer to said second wiring layer via said fourth wiring layer;
- (e) removing said resist arranged between said fourth wiring layer and said third wiring layer to form an air gap between said third and fourth wiring layers, thereby forming an air bridge structure;
- (f) forming a chip from said wafer having said air bridge structure, said chip being covered with a protective coat;
- (g) die bonding said chip having said protective coat to a package;
- and
- (h) removing said protective coat from said chip while keeping said chip fixed on said package.
6 more elements
A method of manufacturing a semiconductor device, comprising the steps of:
- (a) forming first, second, and third wiring layers on a surface of a wafer, wherein said third wiring layer is arranged between said first and said second wiring layers;
- (b) coating surfaces of said first, second, and third wiring layers and a remaining exposed surface of said wafer with a resist;
- (c) partially removing said resist to expose a part of the surfaces of said first and second wiring layers;
- (d) coating said exposed surfaces of said first and second wiring layers, and a surface of said resist with a fourth wiring layer to connect said first wiring layer to said second wiring layer via said fourth wiring layer;
- (e) removing said resist arranged between said fourth wiring layer and said third wiring layer to form an air gap between said third and fourth wiring layers, thereby forming an air bridge structure on said wafer;
- (f) forming a chip from said wafer having said air bridge structure, said chip being covered with a protective coat;
- (g) fixing said chip, having a surface coated with said protective coat, to a base;
- (h) removing said protective coat from said chip while keeping said chip fixed on said base;
- and
- (i) fixing said base to a package.
7 more elements
Dependencies are inferred from the claim text.