US 5,593,913 A · Method of manufacturing solid state imaging device having high sensitivity and exhibiting high degree of light utilization

Abstract

There are provided a solid state imaging device having high sensitivity and exhibiting high degree of light utilization and a method of manufacturing the same. An insulating film 42, a transfer electrode 43, a light shielding film 44, a protective film 45, and a flat layer 51 are formed above a layer having a photoelectric conversion portion, and a concave lens layer 52 is formed on the flat layer 51 to a lattice pattern. The concave lens layer 52 of the lattice pattern is hot melted for conversion into a concave type micro-lens 52. A resin layer 53 having a refractive index smaller than that of the concave lens 52, a buffer layer 54, and a convex type micro-lens 57 are sequentially formed above the concave type micro-lens 52. The concave type micro-lens 52 functions to bring light rays focused by the convex type micro-lens 57 to a position close to light incident vertically upon the photoelectric conversion portion 41.

Claims11

Dependent claims

A method of manufacturing a solid state imaging device wherein a concave type micro-lens layer, a support layer, and a convex type micro-lens are sequentially formed on a photoelectric conversion portion, the method comprising the steps of:

forming a layer of transparent material above the photoelectric conversion portion, said layer of transparent material having a refractive index higher than that of each of the convex type micro-lens and the support layer;
forming a resist lattice pattern of photosensitive resin material over the surface of the layer of transparent material, said lattice pattern having a through-hole opposite to the photoelectric conversion portion;
hot-melting the resist lattice pattern to convert the resist lattice pattern into a resist layer having a concave micro-lens configuration;
and
etching the resist layer, thereby transferring the concave micro-lens configuration of the resist layer onto the layer of transparent material underlying the resist layer so that the layer of transparent material is converted into the concave type micro-lens layer.

2 more elements

Dependencies are inferred from the claim text.

Method of manufacturing solid state imaging device having high sensitivity and exhibiting high degree of light utilization

Life of this patent

Method of manufacturing solid state imaging device having high sensitivity and exhibiting high degree of light utilization

Life of this patent

Abstract

Claims11