Cleaning method and cleaning apparatus
AssigneesKabushiki Kaisha Toshiba, Japan Field Company, Ltd.
InventorsMinoru Inada, Yasutaka Imajo, Masahide Uchino
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AssigneesKabushiki Kaisha Toshiba, Japan Field Company, Ltd.
InventorsMinoru Inada, Yasutaka Imajo, Masahide Uchino
Estimating the term…
A part subjected to cleaning is cleaned or rinsed with a cleaning agent or rinsing agent having a nonaqueous type solvent or a hydrophilic solvent as a main component thereof. Then the cleaning agent or rinsing agent adhering to the cleaned or rinsed part subjected to cleaning is removed with a cleaning agent having perfluorocarbon as a main component thereof or the vapor of the cleaning agent. The part is subsequently dried. Otherwise, after the part subjected to cleaning has been cleaned with an aqueous type solvent or wash with water, the part is cleaned and dried with a cleaning agent having perfluorocarbon as a main component thereof or the vapor of the cleaning agent. The cleaning agent having perfluorocarbon as a main component thereof or the vapor of the cleaning agent can be used for cleaning or rinsing the part subjected to cleaning.
A method of cleaning a metal, electronic, semiconductor, ceramic, glass, plastic, optical or surface-treated part comprising the steps of:
A method of cleaning a metal, electronic, semiconductor, ceramic, glass, plastic, optical or surface-treated part comprising the step of
Dependencies are inferred from the claim text.