Method for forming high resistance resistors for limiting cathode current in field emission displays

A method for forming a resistor for a field emission display, said method comprising:

• forming an emitter site on a conductivity region of a baseplate;
• forming a resistive layer by depositing a resistive material on the baseplate;
• forming a first contact in the resistive material in electrical communication with the conductivity region and with a resistance of (R.sub.C1);
• forming a second contact in the resistive material in electrical communication with a circuit component of the field emission display and with a resistance of (R.sub.C2);
• such that a total resistance (R.sub.T) of the resistor is equal to a sheet resistance (R.sub.S) of the resistive layer plus the resistance (R.sub.C1) of the first contact plus the resistance (R.sub.C2) of the second contact.

A method for forming a resistor for a field emission display, said method comprising:

• forming a baseplate including a glass substrate;
• forming a conductivity region comprising an isolated silicon containing island formed on the substrate;
• forming an emitter site on the conductivity region;
• forming a resistive layer on the baseplate;
• forming a first contact with a resistance of (R.sub.C1) to establish electrical communication between said resistive layer and said conductivity region;
• and
• forming a second contact with a resistance of (R.sub.C2) to establish electrical communication between said resistor and another circuit component;
• such that a total resistance (R.sub.T) of the resistor is equal to a sheet resistance (R.sub.S) of the resistive layer plus the resistance (R.sub.C1) of the first contact plus the resistance (R.sub.C2) of the second contact.