Semiconductor device and method for forming the same

A semiconductor device comprising:

• a substrate;
• a first blocking layer formed on a surface of said substrate;
• a second blocking layer formed on said first blocking layer;
• and
• an insulated gate field effect transistor formed on said second blocking layer,
• wherein said first blocking layer comprises aluminum nitride having an aluminum to nitrogen ratio in the range of 0.9 to 1.4, said second blocking layer comprises silicon oxide and said substrate has a blocking layer only on the upper surface of said substrate.

A semiconductor device comprising:

• a substrate having an upper surface and a lower surface opposite with each other;
• a first blocking layer provided on said upper surface;
• and
• an insulated gate field effect transistor provided over said upper surface with said first blocking layer interposed therebetween,
• wherein said lower surface is coated with a second blocking layer, and the first and second blocking layers comprise aluminum nitride having an aluminum to nitrogen ratio in the range of 0.9 to 1.4.

A semiconductor device comprising:

• an insulating substrate having an upper surface and a lower surface opposite with each other;
• a first blocking layer provided on said upper surface;
• and
• an insulated gate field effect transistor provided over said upper surface with said first blocking layer interposed therebetween,
• wherein said lower surface is coated with a second blocking layer, and the first and second blocking layers comprise aluminum nitride having an aluminum to nitrogen ratio in the range of 0.9 to 1.4.

A semiconductor device comprising:

• a glass substrate having an upper surface and a lower surface opposite with each other;
• a first blocking layer provided on said upper surface;
• and
• an insulated gate field effect transistor provided over said upper surface with said first blocking layer interposed therebetween,
• a second blocking layer provided on said lower surface,
• wherein said second blocking layer and said first blocking layer comprise aluminum nitride having an aluminum to nitrogen ratio in the range of 0.9 to 1.4.

A semiconductor device comprising:

• an insulating substrate having an upper surface and a lower surface opposite with each other;
• a first blocking layer provided on said upper surface;
• and
• an insulated gate field effect transistor provided over said upper surface with said first blocking layer interposed therebetween,
• a second blocking layer provided on said lower surface,
• wherein said second blocking layer and said first blocking layer comprise aluminum nitride having an aluminum to nitrogen ratio in the range of 0.9 to 1.4.

A semiconductor device comprising:

• an insulating substrate;
• a first blocking layer provided on a surface of said substrate;
• a second blocking layer provided on said first blocking layer;
• and
• an insulated gate field effect transistor provided on said second blocking layer,
• wherein said first blocking layer comprises aluminum nitride having an aluminum to nitrogen ratio in the range of 0.9 to 1.4.

A semiconductor device comprising:

• a soda-lime glass substrate;
• a first blocking layer provided on a surface of said substrate;
• a second blocking layer provided on said first blocking layer;
• and
• an insulated gate field effect transistor provided on said second blocking layer,
• wherein said first blocking layer comprises aluminum nitride having an aluminum to nitrogen ratio in the range of 0.9 to 1.4 and said second blocking layer comprises silicon oxide.

A semiconductor device comprising:

• a glass substrate;
• a first blocking layer provided on a surface of said substrate;
• a second blocking layer provided on said first blocking layer;
• and
• an insulated gate field effect transistor provided on said second blocking layer,
• wherein said first blocking layer comprises aluminum nitride having an aluminum to nitrogen ratio in the range of 0.9 to 1.4, and said second blocking layer comprises silicon oxide.

A semiconductor device comprising:

• a substrate having an upper surface and a lower surface opposite with each other;
• a first blocking layer provided on said upper surface;
• a second blocking layer comprising silicon oxide provided on said first blocking layer;
• and
• an insulated gate field effect transistor provided over said upper surface with said first blocking layer and said second blocking layer interposed therebetween,
• wherein said lower surface is coated with a third blocking layer, and the first and third blocking layers comprise aluminum nitride having an aluminum to nitrogen ratio in the range of 0.9 to 1.4.

A semiconductor device comprising:

• an insulating substrate having an upper surface and a lower surface opposite with each other;
• a first blocking layer provided on said upper surface;
• a second blocking layer comprising silicon oxide provided on said first blocking layer;
• and
• an insulated gate field effect transistor provided over said upper surface with said first blocking layer and said second blocking layer interposed therebetween,
• wherein said lower surface is coated with a third blocking layer, and the first and third blocking layers comprise aluminum nitride having an aluminum to nitrogen ratio in the range of 0.9 to 1.4 after nitride.

A semiconductor device comprising:

• a glass substrate having an upper surface and a lower surface opposite with each other;
• a first blocking layer provided on said upper surface;
• a second blocking layer comprising silicon oxide provided on said first blocking layer;
• and
• an insulated gate field effect transistor provided over said upper surface with said first blocking layer and said second blocking layer interposed therebetween,
• wherein said lower surface is coated with a third blocking layer, and the first and third blocking layers comprise aluminum nitride having an aluminum to nitrogen ratio in the range of 0.9 to 1.4.

A semiconductor device comprising:

• a glass substrate having an upper surface and a lower surface opposite with each other,
• a first blocking layer formed on said upper surface of the substrate;
• an insulating gate field effect transistor formed over said upper surface of the substrate with said first blocking layer interposed therebetween,
• wherein said lower surface of the substrate is coated with a second blocking layer, and the first and second blocking layers comprise aluminum nitride and contain an element selected from the group consisting of boron, silicon, carbon and oxygen.

A Semiconductor device comprising:

• a substrate;
• a first blocking layer formed on a surface of said substrate;
• a second blocking layer formed on said first blocking layer;
• and
• all insulated gate field effect transistor formed on said second blocking layer,
• wherein said first blocking layer comprises aluminum nitride, said second blocking layer comprises silicon oxide and said substrate has a blocking layer only on the upper surface of said substrate, and
• wherein said first blocking layer contains an element selected from the group consisting of boron, silicon, carbon and oxygen.

A semiconductor device comprising:

• a substrate having an upper surface and a lower surface opposite with each other;
• a first blocking layer provided on said upper surface;
• and
• an insulated gate field effect transistor provided over said upper surface with said first blocking layer interposed therebetween,
• wherein said lower surface is coated with a second blocking layer, and the first and second blocking layers comprise aluminum nitride and contain an element selected from the group consisting of boron, silicon, carbon and oxygen.

A semiconductor device comprising:

• an insulating substrate having an upper surface and a lower surface opposite with each other;
• a first blocking layer provided on said upper surface;
• and
• an insulated gate field effect transistor provided over said upper surface with said first blocking layer interposed therebetween,
• wherein said lower surface is coated with a second blocking layer, and said first and second blocking layers comprise aluminum nitride and contain an element selected from the group consisting of boron, silicon, carbon and oxygen.

A semiconductor device comprising:

• a glass substrate having an upper surface and a lower surface opposite with each other;
• a first blocking layer provided on said upper surface;
• and
• an insulated gate field effect transistor provided over said upper surface with said first blocking layer interposed therebetween,
• a second blocking layer provided on said lower surface,
• wherein said second blocking layer and said first blocking layer comprise aluminum nitride and contain an element selected from the group consisting of boron, silicon, carbon and oxygen.

A semiconductor device comprising;

• an insulating substrate having an upper surface and a lower surface opposite with each other;
• a first blocking layer provided on said upper surface;
• and
• an insulated gate field effect transistor provided over said upper surface with said first blocking layer interposed therebetween,
• a second blocking layer provided on said lower surface,
• wherein said second blocking layer and said first blocking layer comprise aluminum nitride and contain an element selected from the group consisting of boron, silicon, carbon and oxygen.

A semiconductor device comprising:

• an insulating substrate;
• a first blocking layer provided on a surface of said substrate;
• a second blocking layer provided on said first blocking layer;
• and
• an insulated gate field effect transistor provided on said second blocking layer,
• wherein said first blocking layer comprises aluminum nitride and contains an element selected from the group consisting of boron, silicon, carbon and oxygen.

A semiconductor device comprising:

• a soda-lime glass substrate;
• a first blocking layer provided on a surface of said substrate;
• a second blocking layer provided on said first blocking layer;
• and
• an insulated gate field effect transistor provided on said second blocking layer,
• wherein said first blocking layer comprises aluminum nitride and said second blocking layer comprises silicon oxide and said first blocking layer contains an element selected from the group consisting of boron, silicon, carbon and oxygen.

A semiconductor device comprising:

• a glass substrate;
• a first blocking layer provided on a surface of said substrate;
• a second blocking layer provided on said first blocking layer;
• and
• an insulated gate field effect transistor provided on said second blocking layer,
• wherein said first blocking layer comprises aluminum nitride, and said second blocking layer comprises silicon oxide and said first blocking layer contains an element selected from the group consisting of boron, silicon, carbon and oxygen.

A semiconductor device comprising:

• a substrate having an upper surface and a lower surface opposite with each other;
• a first blocking layer provided on said upper surface;
• a second blocking layer comprising silicon oxide provided on said first blocking layer;
• and
• an insulated gate field effect transistor provided over said upper surface with said first blocking layer and said second blocking layer interposed therebetween,
• wherein said lower surface is coated with a third blocking layer, and the first and third blocking layers comprise aluminum nitride and contain an element selected from the group consisting of boron, silicon, carbon and oxygen.

A semiconductor device comprising:

• an insulating substrate having an upper surface and a lower surface opposite with each other;
• a first blocking layer provided on said upper surface;
• a second blocking layer comprising silicon oxide provided on said first blocking layer;
• and
• an insulated gate field effect transistor provided over said upper surface with said first blocking layer and said second blocking layer interposed therebetween,
• wherein said lower surface is coated with a third blocking layer, and the first and third blocking layers comprise nitride and contain an element selected form the group consisting of boron, silicon, carbon and oxygen.

A semiconductor device comprising:

• a glass substrate having an upper surface and a lower surface opposite with each other;
• a first blocking layer provided on said upper surface;
• a second blocking layer comprising silicon oxide provided on said first blocking layer;
• and
• an insulated gate field effect transistor provided over said upper surface with said first blocking layer and said second blocking layer interposed therebetween,
• wherein said lower surface is coated with a third blocking layer, and the first and third blocking layers comprise aluminum nitride and contain an element selected from the group consisting of boron, silicon, carbon and oxygen.