US 5,581,300 AGranted

Solid state image sensor array having photochromic layer surrounded by passive layer for multiple photoelectric conversion elements in the array

AssigneeGoldstar Co., Ltd.

InventorSung E. Kim

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Abstract

A solid state image sensor is provided having a vertical charge transfer unit, a horizontal charge transfer unit, a photoelectric conversion unit including a plurality of photoelectric conversion elements arranged in a matrix manner, each photoelectric conversion element having a photodiode and switching MOS transistors to output a signal accumulated in the photodiode, and a charge accumulation controller for controlling a charge accumulated by each photodiode in logarithmical proportion to the quantity of light incident on each corresponding photoelectric conversion element corresponding to one pixel. The charge accumulation controller includes a photochromic color filter layer made of a photochromic material. Alternatively, the charge accumulation controller includes a photochromic layer which is formed over an existing color filter layer at a light receiving window area. With this construction, the quantity of light incident on a surface to be image-scanned is not controlled based on the average illumination of an image, but based on the unit of the photoelectric conversion element corresponding to one pixel. Accordingly, it is possible to prevent degradation in image quality at dark areas relative to light areas upon photographing an object including the dark and light areas.

Claims4

Dependent claims

A solid state image sensor comprising:

a vertical charge transfer unit for generating vertical scanning signals in response to vertical input signals;
a horizontal charge transfer unit for generating horizontal scanning signals in response to horizontal input signals;
and
a photoelectric conversion unit having a plurality of photoelectric conversion elements arranged in an array, multiple ones of said photoelectric conversion elements each including
a photodiode adapted to accumulate a signal corresponding to light incident thereon,
first and second switching MOS transistors controllably switched by said vertical and horizontal scanning signals to generate a video signal corresponding to said signal accumulated in said photodiode,
a substrate of a first conductivity type,
a well of a second conductivity type formed on said substrate of said first conductivity type,
first, second and third impurity regions of said first conductivity type formed in said well and serving as sources and drains of said photodiode and said first and second switching MOS transistors,
a first gate of said first switching MOS transistor formed between said first impurity region and said second impurity region above said substrate and insulated by an oxide film formed over said well, said first gate receiving a corresponding one of said vertical scanning signals,
a second gate of said second switching MOS transistor formed between said second impurity region and said third impurity region above said substrate and insulated by said oxide film, said second gate receiving a corresponding one of said horizontal scanning signals,
an insulating phosphorous silicate glass film formed over said oxide film, and
a photochromic color filter layer of a photochromic material positioned at a light transmitting area and surrounded by a passive film.

10 more elements

A solid state image sensor comprising:

a vertical charge transfer unit for generating vertical scanning signals in response to vertical input signals;
a horizontal charge transfer unit for generating horizontal scanning signals in response to horizontal input signals;
and
a photoelectric conversion unit having a plurality of photoelectric conversion elements arranged in an array, multiple ones of said photoelectric conversion elements each including
a photodiode adapted to accumulate a signal corresponding to a light incident thereon,
first and second switching MOS transistors controllably switched by said vertical and horizontal scanning signals to generate a video signal corresponding to said signal accumulated in said photodiode,
a substrate of a first conductivity type,
a well of a second conductivity type formed on said substrate of said first conductivity type,
first, second and third impurity regions of said first conductivity type formed in said well and serving as sources and drains of said photodiode and said first and second switching MOS transistors,
a first gate of said first switching MOS transistor formed between said first impurity region and said second impurity region above said substrate and insulted by an oxide film formed over said well, said first gate receiving a corresponding one of said vertical scanning signals,
a second gate of said second switching MOS transistor formed between said second impurity region and said third impurity region above said substrate and insulated by said oxide film, said second gate receiving a corresponding one of said horizontal scanning signals,
an insulating phosphorous silicate glass film formed over said oxide film,
a color filter layer formed over said phosphorous silicate glass film and surrounded by a passive film, and
a photochromic layer formed over said color filter layer at a light receiving window area and surrounded by said passive film.

11 more elements

Dependencies are inferred from the claim text.

Facts

Application: 08/329,789Filed 27 Oct 1994 · continuation
Priority: KR 16933/199127 Sep 1991
Granted: 3 Dec 1996
Term ends: Not estimatedThe source records don’t support an estimate.

Classification7 codes

H10F 77/331
For devices having potential barriers: for filtering or shielding light, e.g. multicolour filters for photodetectors
H04N 23/70
Cameras or camera modules comprising electronic image sensors; Control thereof: circuitry for compensating brightness variation in the scene
H04N 25/00
Circuitry of solid-state image sensors [ssis]
Y10S 348/902
Television: photochromic