Nanoelectric devices
OwnerMartin Moskovits, Jing M. Xuinventors
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OwnerMartin Moskovits, Jing M. Xuinventors
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Single-electron devices useful as diodes, transistors or other electronic components are prepared by anodizing a metal substrate in sheet or foil form electrolytically in an acid bath, to deposit thereon an oxide film having axially disposed micropores of substantially uniform diameter in the range of from about 1 to about 500 nanometers and substantially uniform depth less than the thickness of the oxide film, leaving an ultra thin oxide layer between the bottom of each pore in the metal substrate. The conductive material is deposited in the pores to form nanowires contacting the oxide layer at the bottom of the pores. Macro metal is deposited over the ends of the nanowires for external electrical contact purposes. Devices can be made according to the present invention which are suitable to exhibit single-electron tunnelling effects and arrays of tunnel junction devices can be prepared having a density up to the order of 10.sup.10 per square cm.
A process of preparing single-electron devices comprising an array of elements each comprising at least two conductors contacting and separated by an ultrathin insulating or semiconducting layer, at least one of the conductors of each element being a nanowire, said process comprising:
Single-electron devices comprising an array of single-electron elements, each said element comprising:
Dependencies are inferred from the claim text.