Antireflection coating for a temperature sensitive substrate

A process for making a coated article, comprising the steps of:

• providing a temperature-sensitive surface having a melting point lower than glass;
• and
• disposing an anti-reflection coating including a plurality of layers substantially transparent to visible light on said surface, said disposing step including the steps of
• DC reactively sputtering a material selected from the group consisting of tin oxide, indium oxide, zinc oxide, tin-doped indium oxide, antimony-doped tin oxide, tin-bismuth oxide, and tin-zinc oxide, and
• depositing at least one other layer having a refractive index different from said DC reactively sputtered material.

An anti-reflection coating for a substrate, comprising:

• four layers substantially transparent to visible light and designated the first, second, third, and fourth layers in consecutive numerical order beginning with the layer farthest from the substrate;
• said first layer substantially composed of silicon dioxide having a refractive index lower than said substrate, an optical thickness of about one-quarter wavelength at a wavelength between 480 and 560 nanometers, and a physical thickness of about 94.2 nanometers;
• said second layer substantially composed of DC reactively sputtered tin oxide having a refractive index higher than said substrate, an optical thickness between about one-quarter and one-third of a wavelength at a wavelength between 480 and 560 nanometers, and a physical thickness of about 76.4 nanometers;
• said third layer substantially composed of silicon dioxide having a refractive index lower than said second layer and a physical thickness of about 31.9 nanometers;
• said fourth layer substantially composed of DC reactively sputtered tin oxide having a refractive index greater than said third layer and a physical thickness of about 20.3 nanometers;
• and
• said third and fourth layers having a total optical thickness less than one-quarter wavelength at a wavelength between 480 and 560 nanometers.

An anti-reflection coating for a substrate, comprising:

• four layers substantially transparent to visible light and designated the first, second, third, and fourth layers in consecutive numerical order beginning with the layer farthest from the substrate;
• said first layer substantially composed of silicon dioxide having a refractive index lower than said substrate, an optical thickness of about one-quarter wavelength at a wavelength between 480 and 560 nanometers, and a physical thickness of about 92.2 nanometers;
• said second layer substantially composed of DC reactively sputtered tin oxide having a refractive index higher than said substrate, an optical thickness between about one-quarter and one-third of a wavelength at a wavelength between 480 and 560 nanometers, and a physical thickness of about 78.1 nanometers;
• said third layer substantially composed of silicon dioxide having a refractive index lower than said second layer and a physical thickness of about 32.2 nanometers;
• said fourth layer substantially composed of DC reactively sputtered tin oxide having a refractive index greater than said third layer and a physical thickness of about 18.6 nanometers;
• and
• said third and fourth layers having a total optical thickness less than one-quarter wavelength at a wavelength between 480 and 560 nanometers.