Method and apparatus for wet treatment of solid surfaces
AssigneeNEC Corporation
InventorsHidemitsu Aoki, Tsutomu Nakajima
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AssigneeNEC Corporation
InventorsHidemitsu Aoki, Tsutomu Nakajima
Estimating the term…
The object of the invention is to accomplish surface treatment such as cleaning, etching or after-treatment of parts or semi-processed articles for the manufacture of industrial or medical products without raising the problem of environmental pollution and without damaging or contaminating the treated articles. Water is electrolyzed in a tank which is partitioned by a porous membrane into an anode chamber and a cathode chamber to prepare a fresh anodic water containing H.sup.+ ion in the anode chamber and a fresh cathodic water containing OH.sup.- ion in the cathode chamber. The fresh anodic water and the fresh cathodic water are separately discharged from the electrolysis tank, and selected one of the anodic water and the cathodic water is brought into contact with the object of wet treatment. The efficiency of electrolysis of water can be enhanced by adding a small amount of an electrolysis aid such as carbon dioxide gas or ammonium acetate to water and/or by irradiating water under electrolysis with an electromagnetic wave having an wavelength not longer than 400 nm or not shorter than 3000 nm.
A method for wet treatment of a surface or surfaces of an inorganic material part for producing a semiconductor device, wherein said part is located outside of an electrolysis tank, comprising the steps of:
A method of cleaning the surface of a dielectric film formed in a process of producing a semiconductor device, wherein the film surface is possibly contaminated with colloidal silica, the method comprising the steps of:
An apparatus for wet treatment of a surface or surfaces of an inorganic material part, comprising:
An apparatus for wet treatment of a surface or surfaces of an inorganic material part, comprising:
A method of cleaning the surfaces of a silicon wafer for use in the fabrication of a semiconductor device, the method comprising the steps of:
An apparatus for wet treatment of a surface or surfaces of an inorganic material part, comprising:
Dependencies are inferred from the claim text.