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US 5,569,330 AGranted
Method and device for chemically treating substrates
AssigneeSteag MicroTech GmbH Donaueschingen
InventorsRobin Schild, Milan Kozak, Johann Durst
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Abstract
A method for treating substrates includes chemically treating at least one substrate in a container with at least one treatment fluid and washing said at least one substrate with a washing fluid in the same container. Subsequently, the at least one substrate is dried.
Claims27
A method for treating substrates, said method comprising the steps of:
- positioning at least one substrate above a container;
- positioning a hood with a guide above the container;
- surrounding said at least one substrate;
- lowering said at lest one substrate into the container;
- chemically treating the at least one substrate in the container with at least one treatment fluid;
- washing said at least one substrate with a washing fluid in the same container;
- lifting said at least one substrate from the container into the hood and guiding said at least one substrate in to the guide of the hood;
- and
- drying said at least one substrate in the hood.
6 more elements
Dependencies are inferred from the claim text.