Interhalogen cleaning of process equipment
AssigneeIntel Corporation
InventorEthan Ashley
Life of this patent
Estimating the term…
Abstract
An improved method and apparatus for removing accumulated films from processing equipment. Accumulated films are removed without disassembling the equipment and by introducing an interhalogen gas into the chamber where it reacts with the accumulated films while only slightly or not reacting at all with the processing chamber or its internal parts. The interhalogens and its products formed are volatile and are easily removed by a vacuum. The noncorrosive reaction takes place without needing a plasma and unlike HCl, the reaction take place from about room temperature to 300.degree. C.
Claims58
A method of removing an accumulated certain processing material from a substantially assembled machine, said machine which includes a processing chamber having an internal part which defines an exposed surface such that when said material is present within said chamber, said material tends to accumulate onto said surface, said material reacting with an interhalogen (IH) to form a gaseous product which is readily removed from said surface when exposed to said IH, said method comprising the steps of:
- a) introducing said IH into said chamber;
- b) subjecting said chamber to a predetermined pressure to ensure that said IH is in its gaseous phase.
- c) allowing a predetermined time for said IH to diffuse to said surface and to react with substantially all of said material to form a gaseous product without significantly etching said surface;
- and
- d) removing from said chamber said gaseous product and unreacted gaseous IH, if any is present.
A method of removing an accumulated certain processing material from a substantially assembled machine, said machine which includes a processing chamber having an internal part which defines an exposed surface such that when said material is present within said chamber, said material tends to accumulate onto said surface, said material plasmalessly reacting with a certain compound between about 0.degree. C. and 300.degree. C. to form a gaseous product which is readily removed from said surface when exposed to said compound, said method comprising the steps of:
- a) regulating said chamber to a predetermined temperature, if required;
- b) introducing said compound into said chamber;
- c) subjecting, said chamber to a predetermined pressure to ensure that said compound is in its gaseous phase;
- d) allowing a predetermined time for said compound to diffuse to said surfaces and to plasmalessly react with substantially all of said material to form a gaseous product, without significantly etching said surface;
- and
- e) removing from said chamber said gaseous product and any unreacted gaseous compound, if any is present.
For use with a substantially assembled machine which includes a processing chamber having an internal part which defines an exposed surface such that when a certain processing material is present within said chamber, said material tends to accumulate onto said surface, said material reacting with an interhalogen (IH) to form a gaseous product which is readily removed from said surface when exposed to said IH, an apparatus for removing said material from said surface comprising:
- a) means for introducing said IH into said chamber;
- b) means for subjecting said chamber to a predetermined pressure to ensure that said IH is in its gaseous phase.
- c) means for allowing a predetermined time for said IH to diffuse to said surface and to react with substantially all of said material to form a gaseous product without significantly etching said surface;
- and
- d) means for removing from said chamber said gaseous product and unreacted gaseous IH, if any is present.
For use with a substantially assembled machine which includes a processing chamber having an internal part which defines an exposed surface such that when a certain processing material is present within said chamber, said material tends to accumulate onto said surface, said material plasmalessly reacting with a compound between 0.degree. C. and 300.degree. C. to form a gaseous product which is readily removed from said surface when exposed to said compound, an apparatus for removing said material from said surface comprising:
- a) means for regulating said chamber to a predetermined temperature, if required;
- b) means for introducing said compound into said chamber;
- c) means for subjecting said chamber to a predetermined pressure to ensure that said compound is in its gaseous phase;
- d) means for allowing a predetermined time for said compound to diffuse to said surface and to plasmalessly react with substantially all of said material to form a gaseous product without significantly etching said surface;
- and
- e) means for removing from said chamber said gaseous product and any unreacted gaseous compound, if any is present.
Dependencies are inferred from the claim text.