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AssigneeExcimer Laser Systems, Inc.
InventorsDavid J. Elliott, Richard F. Hollman, David Shafer
Estimating the term…
A high resolution, deep UV beam delivery system for exposing a surface, directly or through a mask, for the purpose of photolithography, surface cleaning, microstructuring, pattern microimaging, surface modification or the like, the delivery system including a deep UV radiation source for generating a beam of narrow wavelength deep ultraviolet radiation along a path, a first optical system in the path for homogenizing and shaping the deep UV energy in the path; and a second optical system in the path for directing radiation energy onto the surface of a substrate to be processed, the second optical system including large area mirror structure having a numerical aperture of at least 0.3 and a modular compensation assembly of refractive elements disposed between said large area mirror structure and said substrate and corresponding to the wavelength of the radiation source for compensating (reducing) image curvature introduced into the system by the large area mirror structure.
A high resolution, deep UV beam delivery system for exposing a surface, directly or through a mask, for purposes such as photolithography, surface cleaning, microstructuring, pattern micro imaging, or surface modification, said delivery system comprising a deep UV radiation source for generating a beam of deep ulraviolet radiation along a path, a first optical system in said path for homogenizing and shaping the deep UV energy in said path, said homogenizing optical system including a binary optic plate with a first set of regions of normal transmission and a second set of regions where the UV radiation undergoes a 180.degree. phase shift upon transmission;
A high resolution, deep UV beam delivery system for exposing a surface, directly or through a mask, for purposes such as photolithography, surface cleaning, microstructuring, pattern microimaging, or surface modification, said delivery system comprising a deep UV radiation source for generating a beam of deep ultraviolet radiation along a path, a first optical system in said path for homogenizing and shaping the deep UV energy in said path;
A high resolution, deep UV beam delivery system for exposing a surface, directly or through a mask, for purposes such as photolithography, surface cleaning, microstructuring, pattern microimaging, or surface modification, said delivery system comprising a deep UV radiation source for generating a beam of deep ultraviolet radiation along a path, a first optical system in said path for homogenizing and shaping the deep UV energy in said path;
A high resolution, deep UV beam delivery system for exposing a surface, directly or through a mask, for purposes such as photolithography, surface cleaning, microstructuring, pattern microimaging, or surface modification, said delivery system comprising a deep UV radiation source for generating a beam of deep ultraviolet radiation along a path, a first optical system in said path for homogenizing and shaping the deep UV energy in said path;
Deep ultraviolet optical imaging system comprising:
Deep ultraviolet optical imaging system comprising:
A modular compensation assembly of refractive elements for use in a high resolution, deep UV beam delivery system for exposing a surface, directly or through a mask, for purposes such as photolithography, or surface cleaning, microstructuring, pattern microimaging, surface modification, said delivery system comprising a deep UV radiation source for generating a beam of narrow wavelength deep ultraviolet radiation along a path, a first optical system in said path for homogenizing and shaping the deep UV energy in said path;
Dependencies are inferred from the claim text.