Photoresist compositions containing copolymers having acid-labile groups and recurring units derived from either N-(hydroxymethyl)maleimide or N-(acetoxymethyl)maleimide or both
AssigneeOCG Microelectronic Materials, Inc.
InventorsUlrich Sch adeli, Norbert M unzel, Christoph De Leo, Heinz Holzwarth, Eric Tinguely
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