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US 5,558,946 AGranted
Multilayered thin ferroelectric film
AssigneeFuji Xerox Co., Ltd.
InventorKeiichi Nishimoto
Life of this patent
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Abstract
The improved multilayered thin ferroelectric film includes a substrate, a first polycrystalline ferroelectric layer that is formed on the substrate, that has high density and a refractive index of the single-crystal grade but whose surface is not optically smooth, and a second polycrystalline ferroelectric layer that is formed on the first polycrystalline ferroelectric layer, that has a comparatively low density, that has a lower refractive index than the single crystal but which has an optically smooth surface.
Claims4
A multilayered thin ferroelectric film, comprising:
- a substrate;
- a first layer of polycrystalline ferroelectric film of a hydrolyzed organometallic compound that is formed on said substrate and has a refractive index of a single-crystal grade but whose surface is not optically smooth;
- and
- a second layer of polycrystalline ferroelectric film of a hydrolyzed organometallic compound that is formed on said first layer of polycrystalline ferroelectric film, and has a lower refractive index than a single crystal but has an optically smooth surface, the second layer having a density lower than the density of the first layer.
1 more element
Dependencies are inferred from the claim text.