Organic magnetic film and method of manufacturing the same
AssigneeMatsushita Electric Industrial Co., Ltd.
InventorsTadashi Ohtake, Norihisa Mino, Kazufumi Ogawa
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Abstract
According to the invention, the surface of a substrate possessing an active hydrogen group is contacted with a chemical adsorbent containing a radical generation precursor group or metal ion capturing group within a molecule--also possessing a reactive functional group such as halosilyl or alkoxy silyl at its end--to form a chemical adsorption film by removing the unreacted chemical adsorbent, radicals are then generated and magnetism is expressed on the chemical adsorption film.
Claims15
A chemical adsorption magnetic film, consisting essentially of molecules fixed directly or indirectly to a substrate by covalent bonding through at least one atom selected from the group consisting of Si, Ge, Sn, Ti, Zr, S and C, wherein unpaired electrons on a metal or radical are provided in the film.
A method of manufacturing a chemical adsorption magnetic film, said method comprising
- (A) contacting and reacting
- (i) chemical adsorption molecules possessing a radical generation precursor group or metal ion capturing group in a molecule and possessing at least one functional group selected from the group consisting of Formulas (F) and (G), halogenated sulfonyl groups expressed in Formula (H), halogenated sulfinyl groups expressed in Formula (I), Formula (J), and a cyano group with
- (ii) a substrate possessing an active hydrogen and/or alkaline metal, thereby forming a chemical adsorption film, and
- (B) generating radicals in the chemical adsorption film or capturing metal ions:
- AX.sub.n Formula (F)
- where A represents Si, Ge, Sn, Ti or Zr, X represents a halogen, and n represents 1, 2, 3 or 4
- A'(OR).sub.n Formula (G)
- where A' represents Si, Ge, Sn, Ti or Zr, R represents an alkyl group, and n represents 1, 2, 3 or 4 ##STR14## where X represents a halogen ##STR15## where X represents a halogen ##STR16## where A" represents O or N.
A method of manufacturing a chemical adsorption magnetic film, said method comprising
- contacting and reacting
- (i) chemical adsorption molecules possessing a functional group having a radical or metal in a molecule and possessing at least one functional group selected from the group consisting of Formulas (J) and (K), halogenated sulfonyl groups expressed in Formula (L), halogenated sulfinyl groups expressed in Formula (M), Formula (N), and a cyano group with
- (ii) a substrate possessing an active hydrogen and/or alkaline metal, thereby forming a chemical adsorption film:
- AX.sub.n Formula (J)
- where A represent Si, Ge, Sn, Ti or Zr, X represents a halogen, and n represents 1, 2, 3 or 4
- A'(OR).sub.n Formula (K)
- where A' represents Si, Ge, Sn, Ti or Zr, R represents an alkyl group, and n represents 1, 2, 3 or 4 ##STR17## where X represents a halogen ##STR18## where X represents a halogen ##STR19## where A" represents O or N.
Dependencies are inferred from the claim text.