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US 5,549,797 AGranted
Highly corrosion-resistant amorphous alloys
AssigneesKoji Hashimoto, YKK Corporation
InventorsKoji Hashimoto, Hideaki Yoshioka, Asahi Kawashima
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AssigneesKoji Hashimoto, YKK Corporation
InventorsKoji Hashimoto, Hideaki Yoshioka, Asahi Kawashima
Estimating the term…
Amorphous alloy comprising 30 to 75 atomic % Cr, the remainder being substantially at least one element selected from the group consisting of Ti and Zr and alloys represented by the general formula: X.sub.a Cr.sub.b M.sub.c wherein X is at least one element selected from the group consisting of Ti and Zr; M is at least one element selected from the group consisting of Mg, Al, Fe, Co, Ni, Cu, Mo and W; and a, b, and c are, in atomic percentage, a>20, 20 .ltoreq.b.ltoreq.75, 0<c .ltoreq.20 and a+b+c=100. The alloys are excellent in corrosion resistance and wear resistance, form a stable protective film and are spontaneously passive, even in corrosive environment such as a poorly oxidizing, highly corrosive HCl solution containing chlorine ions.
A method for producing a highly corrosion resistant single-phase amorphous alloy containing Cr and Ti comprising the steps of conducting sputtering while rotating one or more substrates about a central shaft and independently rotating the one or more substrates about their own axis to effect uniform sputtering deposition and utilizing a sputtering target having a composition represented by the following formula:
A method for producing a highly corrosion resistant single-phase amorphous alloy containing Cr and Zr comprising the steps of conducting sputtering while rotating one or more substrates about a central shaft and independently rotating the one or more substrates about their own axis to effect uniform sputtering deposition and utilizing a sputtering target having a composition represented by the following formula:
A method for producing a highly corrosion resistant single-phase amorphous alloy containing Cr, Ti and Zr comprising the steps of conducting sputtering while rotating one or more substrates about a central shaft and independently rotating the one or more substrates about their own axis to effect uniform sputtering deposition and utilizing a sputtering target having a composition represented by the following formula:
Dependencies are inferred from the claim text.