Parylene deposition apparatus including a tapered deposition chamber and dual vacuum outlet pumping arrangement
AssigneeSpecialty Coating Systems, Inc.
InventorsWilliam F. Beach, John Wary, Roger A. Olson
Life of this patent
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Abstract
A parylene deposition apparatus is provided for the quick and efficient deposition of Parylene AF4 onto silicon wafers in the production of semiconductor chips. The apparatus includes a frusto-conical shaped deposition chamber which minimizes deposition chamber volume and maximizes flow of vapor over the surface of the wafer, and a vacuum by-pass assembly wherein a high-conductance vacuum outlet is utilized to quickly reduce pressure in the vacuum chamber system and a low-conductance vacuum manifold outlet is utilized to maintain vacuum flow during the deposition procedure.
Claims6
A parylene deposition apparatus comprising:
- a vacuum chamber system including a vaporization chamber, a pyrolysis chamber coupled to said vaporization chamber, and a deposition chamber having an inlet end and an inlet opening in said inlet end, said inlet opening being coupled to said pyrolysis chamber for receiving a gaseous parylene monomer from said pyrolysis chamber, said deposition chamber having a tapered configuration including a smaller dimension end which defines said inlet end of said deposition chamber, and a larger dimension end which defines an outlet end of said deposition chamber;
- a support assembly arranged adjacent the outlet end of the deposition chamber for supporting an article to be coated;
- and
- vacuum means connected to an outlet opening at said outlet end of said deposition chamber for creating sub-atmospheric pressure conditions within said deposition chamber, said pyrolysis chamber and said vaporization chamber, and for drawing vapor flow from said inlet opening through said deposition chamber to said outlet opening, said tapered configuration of said deposition chamber minimizing deposition chamber volume and maximizing flow of monomer vapor over a surface of an article supported on said support assembly.
A parylene deposition apparatus comprising:
- a vacuum chamber system including a vaporization chamber, a pyrolysis chamber coupled to said vaporization chamber, and a deposition chamber having inlet and outlet ends, and further having an inlet opening at said inlet end, said inlet opening being coupled to said pyrolysis chamber for receiving gaseous parylene monomer;
- and
- vacuum means for selectively creating sub-atmospheric pressure conditions within said vacuum chamber system, said vacuum means having a first outlet pipe coupled to an outlet opening at said outlet end of said deposition chamber, and a second outlet pipe coupled to said inlet opening of said deposition chamber, said first outlet pipe having a smaller cross-sectional dimension than said second outlet pipe, said first and second outlet pipes being cooperative for evacuating air from said vacuum chamber system to quickly establish a predetermined sub-atmospheric pressure condition, said vacuum means including valve means disposed in said second outlet pipe for selectively closing said second outlet pipe during a deposition procedure such that said predetermined sub-atmospheric pressure condition is maintained during said deposition procedure only by evacuation through said first outlet pipe through said outlet opening of said deposition chamber.
Dependencies are inferred from the claim text.