Removal of surface contaminants by irradiation from a high energy source

An apparatus for removing contaminants from the surface of a substrate while preserving the molecular crystal structure of the substrate treatment surface, said apparatus comprising:

• a source of gas inert to the substrate treatment surface:
• a gas conduit for conveying a gas from said gas source, said gas conduit having a longitudinal axis and a discharge end being movable relative to the treatment surface;
• a radiation conduit for conveying radiation to the substrate treatment surface, said radiation conduit having a longitudinal axis, an inlet end, and a discharge end, said discharge end being movable relative to the substrate treatment surface;
• a source of radiation coupled to said inlet end of said radiation conduit and irradiating into said inlet end radiation having an energy density and duration sufficient to release surface contaminants from the substrate treatment surface but insufficient to alter the molecular crystal structure of the substrate treatment surface, said discharge end of said radiation conduit and said discharge end of said gas conduit being disposed so that gas discharged from said gas conduit flows across the portion of the treatment surface irradiated by radiation discharged from said radiation conduit;
• and
• means coupled to said gas conduit for directing the flow of gas from said discharge end of said gas conduit radially outwardly away from the longitudinal axis of said gas conduit;
• and
• means coupled to said radiation conduit for directing radiation from said discharge end of said radiation conduit radially outwardly away from the longitudinal axis of said radiation conduit.