Tetraskisazo compound and ink containing the compound
AssigneeSumitomo Chemical Company, Limited
InventorsSatoshi Yamazaki, Hideo Kawashita, Koji Aburada, Kazuya Ogino, Yuriko Tamura, Takashi Omura
Life of this patent
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Abstract
A tetrakisazo compound represented by the following formula (1) in the free acid form: ##STR1## wherein Q.sub.1 and Q.sub.2 independently represent phenylene or naphthylene group which may be optionally substituted, R.sub.4, R.sub.5 and R.sub.6 independently represent a hydrogen atom, a halogen atom, a hydroxy group, a sulfonic acid group or an amino, alkyl, alkoxy, carbamoyl or sulfamoyl group which may be optionally substituted, m is 0 or 1 and n is 1 or 2, and an ink which comprises the tetrakisazo compound. The ink exhibit excellent properties for ink jet printing.
Claims11
A tetrakisazo compound represented by the following formula (1) in the free acid form:
- ##STR23## wherein Q.sub.1 and Q.sub.2 independently represent phenylene or naphthylene group which may be optionally substituted, R.sub.4, R.sub.5 and R.sub.6 independently represent a hydrogen atom, a halogen atom, a hydroxy group, a sulfonic acid group or an amino, alkyl, alkoxy, carbamoyl or sulfamoyl group which may be optionally substituted, m is 0 or 1 and n is 1 or 2;
- or a salt thereof.
A tetrakisazo compound represented by the following formula (5) in the free acid form:
- ##STR27## or a salt thereof.
A tetrakisazo compound represented by the following formula (6):
- ##STR28##
Dependencies are inferred from the claim text.