Apparatus for manufacturing a liquid crystal display substrate, and apparatus for evaluating semiconductor crystals

An apparatus for forming a thin crystalline semiconductor film comprising:

• a processing chamber;
• means located within said processing chamber, for supporting an object having an amorphous semiconductor film;
• laser beam applying means for applying a laser beam onto a target region of the amorphous semiconductor film, to thereby effecting annealing on the target region;
• memory means for storing first information which represents a band-gap spectral reflectance distribution pertaining to a reference semiconductor material;
• laser-beam spectrum detecting means for detecting the laser beam applied onto said target region and reflected therefrom and for obtaining second information which represents a band-gap spectral reflectance distribution pertaining to said target region;
• evaluation means for comparing said first information with said second information and evaluating a crystallized condition of said target region;
• and
• laser-beam energy adjusting means for adjusting energy of the laser beam on the basis of the crystallized condition evaluated by said evaluation means, to thereby reducing a difference between between said first information and said second information into a predetermined range.