Smooth surface CVD diamond films and method for producing same

A method for producing a fine grained diamond film by a chemical vapor deposition (CVD) process comprising depositing a diamond film onto a smooth surface of a heated substrate wherein a diamond growth surface is exposed to a flowing hydrogen and hydrocarbon gas mixture, a hot filament in the path of said flowing gas mixture, said depositing being carried out by passing said gas mixture over at least one filament, said filament being at a temperature between about 1700 to about 2400 degrees Centigrade and being substantially parallel to said surface a distance of about 0.2 to 2 centimeters from said surface, said depositing said diamond film being carried out under conditions of temperature, pressure, and gas concentration which promote the growth of a diamond coating on the surface of the substrate, said substrate temperature being maintained between about 850 to 950 degrees Centigrade, hydrocarbon content being within the range of 0.1 to 2.5 percent of the total volume of said gas mixture, and nitrogen content being selected within a range from about 4 to about 6 volume percent of the total volume for inhibiting the formation and growth of crystal facets in the diamond film whereby said diamond film is deposited uniformly into a single layer having a grain size of less than 1 micron, a Raman graphite peak at 1580 cm.sup.-1 and a sp.sup.2 bond Raman broad peak between 1360-15 cm.sup.-1, said single layer having no Raman signature at 1332 cm.sup.-1 wherein the final growth surface of which is a smooth continuous layer of diamond grains having an average size of less than 1 micron which are bonded together without gaps there-between and whose exposed surfaces are rounded,

• said single layer of polycrystalline diamond has no Raman signature at 1332 cm.sup.-1.