Processing apparatus with means for rotating an object mounting means and a disk body located in the mounting means differently relative to each other

Abstract

There are provided a treatment chamber for removing natural oxide films formed on the surface and the underside of an object to be treated, e.g., a semiconductor wafer, in treating gas ambient atmosphere, holding member for holding the object to be treated in the treatment chamber, and a mounting member with, e.g., pins erected thereon, and a disk body disposed inside the mounting member. The mounting member and the disk body are rotated relatively to each other. The relative rotation of the mounting member and the disk body generates flows of the treating gas, so that the natural oxide films are homogeneously removed from the entire surface and underside of the object to be treated.

Dependencies are inferred from the claim text.