A method for manufacturing a liquid crystal display having a transparent substrate, a plurality of scanning signal lines intersecting a plurality of display signal lines and forming a matrix configuration on a surface of said transparent substrate defining a plurality of pixel regions each bounded by a pair of said plurality of scanning signal lines and a pair of said plurality of display signal lines, a plurality of pixel electrodes corresponding respectively to said plurality of pixel regions, a plurality of switching devices corresponding respectively to said plurality of pixel regions, and a plurality of electrodes respectively within said plurality of pixel regions, said plurality of electrodes being independent from said plurality of scanning signal lines and said plurality of display signal lines, said method comprising steps of:
- forming a first metal layer on a transparent substrate;
- patterning said first metal layer to form bonding pads for connecting inner elements to an outer circuits, to form said plurality of electrodes of a respective plurality of storage capacitance type capacitors in respective ones of said plurality of pixel regions, and to form at least one wiring connecting portion for connecting adjacent ones of said plurality of electrodes;
- forming a second metal layer on the resultant structure having said bonding pads and said plurality of electrodes thereon;
- patterning said second metal layer to form said plurality of scanning signal lines at regular intervals, and to form a plurality of electrodes of a respective plurality of additional capacitance type capacitors respectively within said plurality of pixel regions with an insulating layer therebetween;
- forming an insulating layer on a surface of the resultant structure;
- forming a semiconductor layer on said insulating layer;
- patterning said semiconductor layer to leave only a portion of said semiconductor layer around a portion of said plurality of scanning signal lines;
- forming a transparent conductive layer on a surface of the resultant structure;
- patterning said transparent conductive layer to form said plurality of pixel electrodes respectively opposed to said plurality of electrodes corresponding to said plurality of storage capacitance type capacitor along a periphery thereof;
- forming a third metal layer on the resultant structure;
- and
- patterning said third metal layer to form said plurality of display signal lines regularly arranged and intersecting said plurality of scanning signal lines, and to form respective source and drain electrodes of a thin film transistor on said semiconductor layer.