Method for detecting and examining slightly irregular surface states, scanning probe microscope therefor, and method for fabricating a semiconductor device or a liquid crystal display device using these

A method for examining a slightly irregular surface state, comprising the steps of:

• illuminating a surface of a sample with a light beam for detecting the slightly irregular surface state;
• observing a variation of the light beam occurring due to the slightly irregular surface state to specify the location of the slightly irregular surface state in an x-y plane of the sample;
• making the location of a probe needle of a scanning probe microscope and the location of the slightly irregular surface state on the sample coincide with each other;
• and
• measuring a three-dimensional image of the slightly irregular surface state by means of the scanning probe microscope.

A scanning probe microscope for measuring a three-dimensional image of a surface of a sample, comprising:

• an xyz actuator for three-dimensionally adjusting a position of a probe needle of the scanning probe microscope or the sample to bring the probe needle near the sample;
• a light source for providing a light beam for detecting a slightly irregular surface state present on the surface of the sample;
• a light beam variation sensor, disposed in a dark field section of the light beam, for sensing irregularly reflected light of the light beam caused by the slightly irregular surface state;
• and
• an x-y actuator for specifying the location of the slightly irregular surface state.

A scanning probe microscope for measuring a three-dimensional image of a surface of a sample, comprising:

• an xyz actuator for three-dimensionally adjusting a position of a probe needle of the scanning probe microscope or the sample to bring the probe needle near the sample;
• a light source for providing a light beam for detecting a slightly irregular surface state present on the surface of the sample;
• a light beam variation sensor, disposed in a bright field section of the light beam, for sensing a dark portion of the light beam developed by the slightly irregular surface state;
• and
• an x-y actuator for specifying the location of the slightly irregular surface state.

An atomic force microscope for measuring a three-dimensional image of a surface of a sample, comprising:

• a cantilever;
• a probe needle mounted on a tip of the cantilever and which can be brought near the surface of the sample;
• a light-emitting element and a light-receiving element which are provided for detecting a bending degree of the cantilever;
• an xyz actuator for three-dimensionally adjusting a position of the sample or the cantilever;
• a light source for providing a light beam for detecting a slightly irregular surface state present on the surface of the sample;
• and
• an x-y actuator capable of specifying the location of the slightly irregular surface state present on the surface of the sample.

A scanning tunnel microscope for measuring a three-dimensional image of a surface of a sample, comprising:

• a metallic probe needle which can be brought near the surface of the sample for making tunnel current flow between the sample and the metallic probe needle;
• an xyz actuator for three-dimensionally adjusting a position of the metallic probe needle or the sample;
• a light source for providing a light beam for detecting a slightly irregular surface state present on the surface of the sample;
• and
• an x-y actuator capable of specifying the location of the slightly irregular surface state present on the surface of the sample.

A method for detecting a slightly irregular surface state, comprising the steps of:

• specifying the location of the slightly irregular surface state present on a surface of a sample by means of a particle detector;
• transferring the sample onto a coordinate stage of a scanning probe microscope;
• approximately linking the location of the slightly irregular surface state specified by the particle detector to a coordinate system of the coordinate stage of the scanning probe microscope;
• illuminating with a light beam a limited region of the surface of the sample which includes the location of the slightly irregular surface state represented in terms of the coordinate system of the coordinate stage to again specify the location of the slightly irregular surface state;
• and
• registering the location of the slightly irregular surface state again specified in terms of the coordinate system of the scanning probe microscope.