Polishing method, device and buff wheel therefor
AssigneesAsahi Tec Corporation, BBF Yamate Corporation
InventorShuji Kawasaki
Life of this patent
Estimating the term…
Abstract
In a polishing method for polishing a work (W) by a rotating buff wheel (12) while polishing agent (B) is supplied between the polishing surface (121) of the buff wheel (12) and the surface of the works (W) to be polished, the surface of the work (W) to be polished is polished while the polishing surface of the buff wheel (12) is moved back and forth relative to the surface of the work (W) to be polished.
Claims31
A polishing method in which a work (W) is polished by a buff wheel (12) rotated by rotary drive means (1) while polishing agent (B) is supplied in a gap between the polishing surface (121) of the buff wheel (12) and the surface of the work (W) to be polished, characterized in that the polishing surface (121) of the buff wheel (12) is capable of reciprocating parallel to the surface of the work (W) to be polished while the polishing is performed.
A polishing device comprising rotary drive means (1) and a buff wheel (12) for polishing a work (W) with a polishing surface (121) of the buff wheel (12) while the buff wheel (12) is rotated by the rotary drive means, characterized in that the polishing surface (121) of the buff wheel (12) is made capable of reciprocating parallel to the surface of the work (W) to be polished.
A polishing device comprising a work (W) with a surface to be polished, and buff wheels (12) rotated by suitable means, for polishing the work (W) arranged to be capable of rotating about an axis in the center of the surface to be polished by the bottom surfaces of the buff wheels (12), characterized in that the buff wheels (12) are provided in a pair, and the buff wheels (12) are rotated respectively in opposite directions each other.
A polishing device comprising a work (W) with a surface to be polished, and buff wheels (12) rotated by suitable means, for polishing the work (W) arranged to be capable of rotating about an axis in the center of the surface to be polished by the outer circumferential surfaces of the buff wheels (12), (22), characterized in that the buff wheels (12), (22) are provided in a pair, one (12) of the buff wheels is rotated in the direction same with the rotating direction of the work (W) and brought into contact with the surface of the work (W) to be polished while the other one (22) of the buff wheels is rotated in the direction opposite the rotating direction of the work (W) and brought into contact with the surface of the work (W) to be polished.
A polishing method in which a work (W) is polished by rotating buff wheels (12), (22) while polishing agent (B) is supplied in gaps between the polishing surfaces of buff wheels (12), (22) and the surface of the work (W) to be polished, characterized in that the rotary shafts (11), (21) respectively of the buff wheels (12), (22) are oscillated along the surface of the work (W) to be polished while the polishing is performed.
A polishing device comprising rotary drive means (1), (2) and buff wheels (12), (22) for polishing the surface of the work (W) to be polished by the polishing surfaces of the buff wheels (12), (22) rotated by the rotary drive means (1), (2), characterized in that the rotary shafts (11), (21) of the buff wheels (12), (22) are made capable of oscillating along the surface of the work (W) to be polished.
A polishing method in which the work (W) is polished by rotating buff wheels (12), (22) while the polishing agent (B) is supplied in the gap between the polishing surfaces (121), (221) of the buff wheels (12), (22) and the surface of the work (W) to be polished, characterized in that the polishing agent (B) is heated to maintain convection.
A polishing method in which the work (W) is polished by rotating buff wheels (12), (22) while the polishing agent (B) is supplied in the gap between the polishing surfaces (121), (221) of tire buff wheels (12), (22) and the surface of the work (W) to be polished, characterized in that the work (W) is polished after the work (W) is heated.
A polishing device in which the work (W) is polished by rotating buff wheels (12), (22) while the polishing agent (B) is supplied in the gap between the polishing surfaces (121), (221) of the buff wheels (12), (22) and the surface of the work (W) to be polished, characterized in that the device comprises a reservoir (5) for the polishing agent (B) and the reservoir (5) is provided with heating means for maintaining connection.
A polishing device in which the work (W) is polished by rotating buff wheels (12), (22) while the polishing agent (B) is supplied in the gap between the polishing surfaces (121), (221) of the buff wheels (12), (22) and the surface of the work (W) to be polished, characterized in that the device is provided with means for heating the work (W).
A polishing buff wheel characterized in that a boss member (15) is detachably arranged in the axial center portion of an elastic disk body (16) and a detachable polishing sheet (17) is provided on the outer circumferential surface of the disk body (16).
A polishing buff wheel characterized in that a boss member (15) is detachably arranged in the axial center portion of an elastic disk body (16) and one side surface of the disk body (16) is made project beyond the boss member (15) and the projecting one side surface of the disk body (16) is provided with the detachable polishing sheet (17).
Dependencies are inferred from the claim text.