A process for controlling chemical and physical properties of selected areas of a surface capable of forming a thiol self-assembled monolayer according to a predetermined pattern, said process comprising the steps of:
- forming a self-assembled monolayer of a first thiolate compound on said surface;
- exposing said self-assembled monolayer in the presence of oxygen to electromagnetic radiation distributed according to said predetermined pattern, said electromagnetic radiation selected from the group consisting of ultra violet and x-ray radiation;
- and
- immersing the self-assembled monolayer in a solution of a compound which forms a second thiolate compound different from said first thiolate compound.