Dry etching apparatus
AssigneeMatsushita Electric Industrial Co., Ltd.
InventorsIzuru Matsuda, Masaki Suzuki
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Abstract
A dry etching apparatus includes a first electrode provided with means for controlling a temperature of a to-be-etched member, a second electrode disposed facing in parallel to the first electrode, a vacuum container housing the first and second electrodes therein, a device for feeding etching gas into the vacuum container, and a device for impressing a high frequency power between the first and second electrodes. A surface of the first electrode to be in touch with both the to-be-etched member and the etching gas and to which the high frequency power is impressed is coated with an insulating film of volume resistivity .rho. within a range: 1.times.10.sup.8 .OMEGA.cm.ltoreq..rho.<1.times.10.sup.9 .OMEGA.cm.
Claims8
A dry etching apparatus comprising:
- a first electrode provided with means for controlling a temperature of a to-be-etched member;
- a second electrode disposed facing in parallel to the first electrode;
- a vacuum container housing the first and second electrodes therein;
- means for feeding etching gas into the vacuum container;
- and
- means for impressing a high frequency power between the first and second electrodes, wherein a surface of the first electrode to be in touch with both the to-be-etched member and the etching gas and to which the high frequency power is impressed is coated with an insulating film of volume resistivity .rho. within a range:
- 1.times.10.sup.8 .OMEGA.cm.ltoreq..rho.1.times.10.sup.9 .OMEGA.cm.
Dependencies are inferred from the claim text.