Pressure pulse cleaning
OwnerPaula M. Wetmore, Val J. Krukonis +1inventors
InventorsPaula M. Wetmore, Val J. Krukonis, Michael P. Coffey
Life of this patent
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OwnerPaula M. Wetmore, Val J. Krukonis +1inventors
InventorsPaula M. Wetmore, Val J. Krukonis, Michael P. Coffey
Estimating the term…
The present invention is a method which relies on pressure pulse cleaning. By "pressure pulse cleaning" it is meant that the pressure and temperature of a fluid, such as carbon dioxide is raised to near or above supercritical conditions, which is then contacted with the item(s) to be cleaned. Periodically, the pressure of the supercritical fluid is pulsed or spiked to higher levels and returned to substantially the original level. Potential candidates for treatment by the present invention include but are not limited to precision parts such as gyroscopes used in missile guidance systems, accelerometers, thermal switches, nuclear valve seals, electromechanical assemblies, polymeric containers, special camera lenses, laser optics components, and porous ceramics.
A method for cleaning items using supercritical fluids comprised of the steps of:
Dependencies are inferred from the claim text.