Treating liquid supplying apparatus for a substrate spin treating apparatus

Apparatus for applying treating liquid to a substrate which is supported for a spinning motion by substrate spin treating equipment, said apparatus comprising:

• a plurality of nozzles each for supplying a treating liquid to a substrate supported for a spinning motion;
• a plurality of tubes each for connecting an individual one of said nozzles to a supply of treating liquid;
• temperature control piping for contacting said tubes to maintain treating liquids in said tubes at a constant temperature;
• and
• a common nozzle moving unit for selecting and moving each of the nozzles one at a time to a dispensing position, with the nozzle that is moved to said dispensing position being disposed to dispense a treating liquid that impinges upon a substrate disposed below and vertically aligned with said dispensing position;
• a plurality of rigid support arms each supporting an individual set comprising one of said nozzles and one of said tubes;
• said nozzle moving unit comprising:
• a plurality of arm swing supports each individually pivotally supporting said support arms, respectively,
• an arm selecting and moving device for moving a selected one of said arm swing supports to a predetermined position located outboard of a substrate to which said apparatus is to supply a treating liquid,
• aligning and engaging means for engaging a selected swing arm support moved to said predetermined position by said arm selecting and moving means, to render said selected swing arm support and said support arm supported thereby pivotable about a pivot axis P displaced horizontally from said nozzles, and
• an arm swing for engaging and swinging said selected support arm aligned by said aligning and engaging means, to move the nozzle supported by said selected support arm between said dispensing position and a standby position displaced outboard of a substrate to which treating liquid is to be applied.

Apparatus for applying treating liquid to a substrate which is supported for a spinning motion by substrate spin treating apparatus comprising:

• a plurality of nozzles each for supplying a treating liquid to a substrate supported for a spinning motion;
• a plurality of tubes each for connecting an individual one of said nozzles to a supply of treating liquid;
• temperature control piping for contacting said tubes to maintain treating liquids in said tubes at a constant temperature;
• and
• a common nozzle moving device for selecting and moving each of the nozzles one at a time to a dispensing position aligned above substrate for dispensing a treating liquid thereon;
• a plurality of rigid support arms each of which supports an individual set comprising one of said nozzles and one of said tubes;
• said common nozzle moving device comprising:
• a plurality of arm swing supports each of which supports an individual one of said support arms for pivotable motion about different predetermined pivotal axes located outboard of a substrate positioned for treatment by said apparatus;
• arm selecting means movable from one of said support arms to another to engage a selected support arm;
• and
• an arm swing for drivingly engaging and swinging said selected support arm engaged by said arm selecting means in a position outboard of a substrate positioned for treatment, to move the nozzle supported by said selected support arm between said dispensing position and a standby position outboard of a substrate positioned for treatment.