Positive resist composition comprising a bis (t-butoxycarbonylmethly(thymolphthalein as a dissolution inhibitor
AssigneesShin-Etsu Chemical Co., Ltd., Nippon Telegraph and Telephone Corporation
InventorsHiroshi Ban, Akinobu Tanaka, Fujio Yagihasi, Jun Watanabe, Minoru Takamizawa
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Abstract
A positive resist composition comprising a poly(p-hydroxystyrene) as matrix resin which is synthesized by an anionic polymerization method and has a weight average molecular weight of from 8,000 to 20,000, bis(p-t-butoxycarbonylmethyl)thymolphthalein as dissolution inhibitor, bis(p-t-butylphenyl)iodonium triflate as acid generator; a compound which contains one amino group and one carboxyl group to function as acid deactivator and propylene glycol monomethyl ether acetate as organic solvent.
Claims8
A positive resist composition comprising:
- 63 to 80 parts by weight of a poly(p-hydroxystyrene),
- 16 to less than 30 parts by weight of a dissolution inhibitor,
- 4 to less than 7 parts by weight of an onium salt,
- 0.0065 to less than 0.05% by weight in the resist composition of a nonionic surfactant,
- 1.2 to less than 6 micromoles per gram of the mixture of poly(p-hydroxystyrene), dissolution inhibitor and onium salt of an acid deactivator and
- an organic solvent;
- said poly(p-hydroxystyrene) being a poly(p-hydroxystyrene) synthesized by an anionic polymerization method and having a weight average molecular weight of from 8,000 to 20,000, said dissolution inhibitor being bis(p-t-butoxycarbonylmethyl)thymolphthalein represented by the following structural formula (I), said onium salt being bis(p-t-butylphenyl) iodonium triflate, said acid deactivator being a compound containing one amino group and one carboxyl group, and said organic solvent being propylene glycol monomethyl ether acetate:
- ##STR3##
Dependencies are inferred from the claim text.