Top nail coat composition
AssigneeAlmell, Ltd.
InventorFrederick L. Martin
Life of this patent
Estimating the term…
Abstract
A top coat nail polish composition, which is at least substantially free of aromatic solvents, contains at least one cellulose ester, a mixture of aliphatic and cycloaliphatic solvents for the cellulose ester, a plasticizer for the cellulose ester, at least two UV blocking agents having different effective UV wavelength blockage ranges, a smoothing agent, an adhesion promoter, and an alkanol solvent for the smoothing agent and the adhesion promoter.
Claims17
A composition comprising:
- at least one cellulose ester containing monocarboxylic acid groups having from 2 to 4 carbon atoms, and
- solvent for said at least one cellulose ester, said solvent consisting essentially of a mixture of at least one aliphatic solvent for said at least one cellulose ester and at least one cycloaliphatic solvent for said at least one cellulose ester, the composition being at least substantially free of aromatic solvents;
- wherein said at least one aliphatic solvent for said at least one cellulose ester is selected from the group consisting of alkanes having 4 to 6 carbon atoms, aliphatic esters having 3 to 6 carbon atoms, and alkanols having 2 to 6 carbon atoms;
- wherein said at least one cycloaliphatic solvent for said at least one cellulose ester is selected from the group consisting of cycloalkanes having 4 to 6 carbon atoms, cycloaliphatic esters having 4 to 6 carbon atoms, and cycloalkanols having 4 to 6 carbon atoms;
- wherein said at least one cycloaliphatic solvent constitutes from about 1 to about 20 volume percent of said mixture;
- wherein said mixture comprises about 30 to about 45 volume percent ethyl acetate, about 40 to about 65 volume percent n-butyl acetate, and about 5 to about 20 volume percent naphthenic material,
- and wherein said naphthenic material is a mixture of acyclic paraffins and cycloparaffins containing less than 1 percent aromatics.
A top coat nail polish composition comprising:
- at least one cellulose acetate butyrate ester,
- solvent for said at least one cellulose acetate butyrate ester, said solvent consisting essentially of a mixture of at least one aliphatic solvent for said at least one cellulose acetate butyrate ester and at least one cycloaliphatic solvent for said at least one cellulose acetate butyrate ester, wherein said at least one aliphatic solvent for the cellulose ester is selected from the group consisting of alkanes having 4 to 6 carbon atoms, aliphatic esters having 3 to 6 carbon atoms, and alkanols having 2 to 6 carbon atoms, wherein said at least one cycloaliphatic solvent for the cellulose ester is selected from the group consisting of cycloalkanes having 4 to 6 carbon atoms, cycloaliphatic esters having 4 to 6 carbon atoms, and cycloalkanols having 4 to 6 carbon atoms, and wherein said at least one cycloaliphatic solvent constitutes from about 1 to about 20 volume percent of said mixture,
- a plasticizer for said at least one cellulose acetate butyrate ester, and
- at least one UV blocking agent,
- the top coat nail polish composition being at least substantially free of aromatic solvents,
- wherein said mixture comprises about 30 to about 45 volume percent ethyl acetate, about 40 to about 65 volume percent n-butyl acetate, and about 5 to about 20 volume percent naphthenic material, and
- wherein said naphthenic material is a mixture of acyclic paraffins and cycloparaffins containing less than 1 percent aromatics.
A composition consisting essentially of the following:
- ______________________________________ INGREDIENT AMOUNT ______________________________________ Ethyl acetate 30.0 fluid oz. N-butyl acetate 48.0 fluid oz. Naphthenic material 10.0 fluid oz. Cellulose acetate butyrate ester 381 560 grams Cellulose acetate butyrate ester 551 80 grams Benzophenone-1 4 grams Benzophenone-3 0.01 gram Butyl benzyl phthalate 4.0 fluid oz. Polysiloxane copolymer 12 grams Aminomethoxysilane 1 gram Isopropyl alcohol 10.0 fluid oz. ______________________________________
- wherein said naphthenic material is a mixture of acyclic paraffins and cycloparaffins containing less than 1 percent aromatics.
A method for making a top coat nail polish composition comprising at least one cellulose ester containing monocarboxylic acid groups having 2 to 4 carbon atoms, and solvent, wherein said solvent consists essentially of a mixture of at least one aliphatic solvent and at least one cycloaliphatic solvent and wherein said top coat nail polish composition is at least substantially free of aromatic solvents, said method comprising:
- forming a mixed solvent, said mixed solvent consisting essentially of a mixture of at least one aliphatic solvent and at least one cycloaliphatic solvent;
- wherein each said at least one aliphatic solvent is selected from the group consisting of alkanes having 4 to 6 carbon atoms, aliphatic esters having 3 to 6 carbon atoms, and alkanols having 2 to 6 carbon atoms;
- wherein each said at least one cycloaliphatic solvent is selected from the group consisting of cycloalkanes having 4 to 6 carbon atoms, cycloaliphatic esters having 4 to 6 carbon atoms, and cycloalkanols having 4 to 6 carbon atoms;
- and
- wherein said at least one cycloaliphatic solvent constitutes from about 1 to about 20 volume percent of said mixed solvent;
- dissolving at least one cellulose ester in said mixed solvent to form a first solution;
- wherein said at least one cellulose ester comprises at least one cellulose acetate butyrate ester;
- adding to said first solution at least one plasticizer for said at least one cellulose ester and at least two UV blocking agents having effective UV wavelength blockage ranges which are different from each other;
- mixing a smoothing agent and an adhesion promotor with a suitable alkanol having 2 to 6 carbon atoms to form a second solution;
- wherein said smoothing agent improves levelness and gloss of a surface of the top coat nail polish composition upon drying;
- wherein said adhesion promotor improves adhesion of the top coat nail polish composition to any previously applied coats;
- wherein said suitable alkanol is suitable to facilitate introduction of said smoothing agent and said adhesion promotor into the top coat nail polish composition;
- and
- combining said second solution and said first solution containing the thus added at least one plasticizer and the thus added at least two UV blocking agents,
- wherein said mixture comprises about 30 to about 45 volume percent ethyl acetate, about 40 to about 65 volume percent n-butyl acetate, and about 5 to about 20 volume percent naphthenic material;
- and
- wherein said naphthenic material is a mixture of acyclic paraffins and cycloparaffins containing less than 1 percent aromatics.
Dependencies are inferred from the claim text.