Sputtering electrode
AssigneeMatsushita Electric Industrial Co., Ltd.
InventorsHitoshi Yamanishi, Isamu Aokura, Toshiyuki Suemitsu, Takahiro Takisawa
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Abstract
A magnetron sputtering electrode assembly which is used in a sputtering system having a rectangular flat-plate target, includes permanent magnets arranged along the longitudinal edges of the target to pass lines of magnetic forces in parallel to the surface of the rectangular flat-plate target, and a driving device for reversing polarity of the magnets to change by 180 degrees the direction of the lines of magnetic force caused by the permanent magnets passing in parallel to the surface of the rectangular flat-plate target.
Claims7
A magnetron sputtering electrode assembly having a rectangular flat-plate target with a sputtering surface and opposite longitudinal edges, said magnetron sputtering electrode assembly comprising:
- elongated permanent magnets, respectively arranged along the opposite longitudinal edges of the rectangular flat-plate target and outwardly from the opposite longitudinal edges of the rectangular flat-plate target in the transverse direction thereof, for passing lines of magnetic force transversely across the sputtering surface of the rectangular flat-plate target such that the lines of magnetic force are continuously parallel to the entire width of the sputtering surface of the rectangular flat-plate target;
- and
- a driving device for reversing the polarity of said permanent magnets to thereby change by 180 degrees the direction of the lines of magnetic force caused by said permanent magnets in parallel to the sputtering surface of the rectangular flat-plate target.
Dependencies are inferred from the claim text.