Method of making thin-layer component
AssigneeMinolta Camera Kabushiki Kaisha
InventorsShunichi Hayamizu, Tomoko Miyaura, Noboru Saeki
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Abstract
The present invention relates to a thin-layer component having a thin layer of (100)-oriented platinum or the other metals in Group VIII, which is formed on amorphous silicon dioxide, and further relates to a thin-layer producing system for producing such thin-layer components, the thin-layer producing system being a sputtering system wherein an auxiliary electrode is provided between two electrodes.
Claims9
A method for producing a thin layer component (100)-oriented platinum in a vacuum chamber which has a target as a first electrode and an auxiliary electrode providing spaces through which particles sputtered out of the target can pass, comprising:
- setting a substrate as a second electrode in a manner such that the auxiliary electrode is arranged between the target and the substrate;
- introducing an argon and oxygen gas mixture into the vacuum chamber;
- and
- forming an electric field between the auxiliary electrode and the target independently of an electric field formed between the auxiliary electrode and the substrate, such that plasma is generated only between the auxiliary electrode and the target.
Dependencies are inferred from the claim text.