Method of X-ray mapping analysis
AssigneeSeiko Instruments Inc.
InventorKiyoshi Hasegawa
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AssigneeSeiko Instruments Inc.
InventorKiyoshi Hasegawa
Estimating the term…
The sample stage is scanned in a grid pattern with a feed pitch finer than the width of the primary beams, and with X-ray intensities at each point as values, primary and secondary mapping data are prepared. In order to convert the shape and size of the primary beam into a size of each of the mapping data, a beam template is prepared in which portions irradiated with primary beam being"1" and portions not irradiated being "0". The background intensity is determined as a threshold value, and at the positions where the value of the primary mapping data is below the threshold value, beam template is overlaid on the secondary mapping data. Those values in the secondary mapping data corresponding to "1" portions of the beam template are replaced with "0", and this is performed over all the measured points, thereby data closely approximating the actual boundary of the element concerned is obtained on the secondary mapping data.
A method of X-ray mapping analysis in an X-ray mapping device comprising an excitation beam source which irradiates samples with a primary beam to excite X-rays, a controllable sample stage movable in at least longitudinal and lateral axes, an X-ray detector which detects said X-rays from said samples and a data processor which processes data, said method comprising the steps of:
A method of X-ray mapping analysis in an X-ray mapping device comprising an excitation beam source which irradiates a sample with a primary beam to excite X-rays, a controllable sample stage movable in at least longitudinal and lateral axes, an X-ray detector which detects said X-rays from said samples and a data processor which processes data, said method comprising the steps of:
Dependencies are inferred from the claim text.