Inclination detecting apparatus and method
AssigneeNikon Corporation
InventorsHideo Mizutani, Kesayoshi Amano, Shinji Wakamoto, Yuji Imai
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AssigneeNikon Corporation
InventorsHideo Mizutani, Kesayoshi Amano, Shinji Wakamoto, Yuji Imai
Estimating the term…
An inclination detecting apparatus is for detecting an inclination of a front surface of a transparent wafer placed on a perpendicular to an optical axis of a projection objective in an exposure apparatus. The inclination detecting apparatus includes an illumination optical system and a condenser optical system. The illumination optical system obliquely supplies a collimated beam onto the front surface of the wafer. The condenser optical system can condense the collimated beam supplied from the illumination optical system and reflected by the wafer, and it has a quartered photodetector for receiving the reflected beam and generating a position signal corresponding to a light receiving position. The apparatus further includes a first slit plate and a second slit plate located in the illumination optical system and the condenser optical system respectively. Each of the slit plate has a plurality of slits which are arranged such that light shield portions between slits of the second slit plate can cut off the collimated beam reflected by the back surface of the wafer.
An inclination detecting apparatus for detecting an inclination of an object relative to a plane which a predetermined reference axis crosses, comprising:
A projection type exposure apparatus comprising:
An inclination detecting method for detecting an inclination of a front surface of a transparent object comprising the steps of:
An apparatus for detecting an inclination of a substrate relative to a reference surface comprising:
A method for detecting an inclination of a substrate onto which a first pattern is projected by a projection optical system to form an image of said first pattern on said substrate, comprising:
Dependencies are inferred from the claim text.