Deep ultraviolet photolithographically defined ultra-thin films for selective cell adhesion and outgrowth and method of manufacturing the same and devices containing the same

A cell-based microsensor, comprising:

• (i) at least one transducer;
• and
• (ii) a substrate having a patterned surface for the selective adhesion and outgrowth of cells;
• wherein said patterned surface contains at least one region having an exposed surface of at least one cell adhesion promoter, such that said region is spatially related to said transducer so that a cell adhering to said region may be stimulated or detected by said transducer;
• wherein said patterned surface is prepared by a method comprising:
• (i) coating a substrate with a first compound to obtain an ultra-thin film which is reactive to radiation and has an exposed surface of at least one cell adhesion promoter or cell adhesion inhibitor;
• and
• (ii) irradiating said ultra-thin film in a pattern to obtain an irradiated film with a surface region in which at least a fraction of said promoter or inhibitor has been removed,
• wherein said cell adhesion promoter contains a group selected from the group consisting of --NHCH.sub.2 CH.sub.2 NHCH.sub.2 CH.sub.2 NH.sub.2, --NHCH.sub.2 CH.sub.2 NH.sub.2, 11-aminoundecyl, 3-aminopropyl, 3-(-aminopropoxy)-3,3-dimethyl-1-propenyl, 6-(aminohexyl)propyl, N-(2-aminoethyl)-3-aminopropyl, --(CH.sub.2).sub.3 -NH-(CH.sub.2).sub.2 -NH-(CH.sub.2 .paren close-st..sub.3, Gly-Arg-Gly-Asp-Tyr-, and Gly-Tyr-Ile-Gly-Ser-Arg-Tyr, and wherein said cell adhesion inhibitor contains a fluorinated alkyl group.

An implant, comprising at least one patterned surface for the selective adhesion and outgrowth of cells, wherein said patterned surface is prepared by a method, comprising:

• (i) coating a substrate with a first compound to obtain an ultra-thin film which is reactive to radiation and has an exposed surface of at least one cell adhesion promoter or cell adhesion inhibitor;
• and
• (ii) irradiating said ultra-thin film in a pattern to obtain an irradiated film with a surface region in which at least a fraction of said promoter or inhibitor has been removed,
• wherein said cell adhesion promoter contains a group selected from the group consisting of --NHCH.sub.2 CH.sub.2 NHCH.sub.2 CH.sub.2 NH.sub.2, --NHCH.sub.2 CH.sub.2 NH.sub.2, 11-aminoundecyl, 3-aminopropyl, 3-(-aminopropoxy)-3,3-dimethyl-1-propenyl, 6-(aminohexyl)propyl, N-(2-aminoethyl)-3-aminopropyl, --(CH.sub.2)3--NH--(CH.sub.2).sub.2 --NH--(CH.sub.2 .paren close-st..sub.3, Gly-Arg-Gly-Asp-Tyr-, and Gly-Tyr-Ile-Gly-Ser-Arg-Tyr, and wherein said cell adhesion inhibitor contains a fluorinated alkyl group.

A method for culturing cells, comprising plating cells on a patterned surface for the selective adhesion and outgrowth of cells, wherein said patterned surface is prepared by a process comprising:

• (i) coating a substrate with a first compound to obtain an ultra-thin film which is reactive to radiation and has an exposed surface of at least one cell adhesion promoter or cell adhesion inhibitor;
• and
• (ii) irradiating said ultra-thin film in a pattern to obtain an irradiated film with a surface region in which at least a fraction of said promoter or inhibitor has been removed,
• wherein said cell adhesion promoter contains a group selected from the group consisting of --NHCH.sub.2 CH.sub.2 NHCH.sub.2 CH.sub.2 NH.sub.2, --NHCH.sub.2 CH.sub.2 NH.sub.2, 11-aminoundecyl, 3-aminopropyl, 3-(-aminopropoxy)-3,3-dimethyl-1-propenyl, 6-(aminohexyl)propyl, N-(2-aminoethyl)-3-aminopropyl, --(CH.sub.2).sub.3 --NH--(CH.sub.2).sub.2 --NH--(CH.sub.2 .paren close-st..sub.3, Gly-Arg-Gly-Asp-Tyr-, and Gly-Tyr-Ile-Gly-Ser-Arg-Tyr, and wherein said cell adhesion inhibitor contains a fluorinated alkyl group.