Electrochemical generation of silane

An apparatus for fabrication of a device having at least one region including elemental silicon, a silicon alloy, or a silicon compound, the apparatus comprising:

• a reaction chamber for deposition of elemental silicon, a silicon alloy, or a silicon compound, the reaction chamber including a component for dissociation of a silane, the dissociation component selected from heating elements, plasma-generating electrodes, microwave plasma generators, and photolyzers;
• a gas supply line connected to the reaction chamber for supplying a silane to the reaction chamber;
• and
• an electrochemical cell communicating with the gas supply line, the electrochemical cell comprising a first electrode, a solid precursor material for the production of silane in contact with the first electrode, means for generating a supply of H.sup.+ ions, a second electrode, and a receptacle for retaining an electrolyte.

An apparatus for fabrication of an article having at least one region including elemental silicon, a silicon alloy, or a silicon compound, the apparatus comprising:

• a reaction chamber for deposition of elemental silicon, a silicon alloy, or a silicon compound, the reaction chamber including a component for dissociation of a silane, the dissociation component selected from heating elements, plasma-generating electrodes, microwave plasma generators, and photolyzers;
• a gas supply line connected to the reaction chamber for supplying a silane to the reaction chamber;
• and
• an electrochemical cell communicating with the gas supply line, the electrochemical cell comprising a first electrode, a packed bed electrode comprising precursor material including silicon for the production of silane positioned adjacent a second electrode, an ion exchange membrane positioned between the first and second electrodes, and a receptacle for retaining an electrolyte.