Fabrication of high aspect ratio spacers for field emission display
AssigneeIndustrial Technology Research Institute
InventorsJammy C. Huang, David N. Liu
Life of this patent
Estimating the term…
Abstract
A method for fabricating high aspect ratio spacers for a field emission display is described. An array of field emission microtips is formed over a substrate. A layer of lithographic material is formed over the array of field emission microtips. Openings are formed in the layer of lithographic material. The openings may be formed by a plasma etch with oxygen, or by x-ray lithography. A non-outgassing material is formed over the surface of the layer of lithographic material, including in the openings. The openings are filled with a spacer material, the spacer material being a conductive material, an insulator, or, preferably, a combination thereof. Lastly, the layer of lithographic material and the non-outgassing material are removed.
Claims33
A method of fabricating a field emission display having high aspect ratio spacers, comprising the steps of:
- forming an array of field emission microtips over a substrate;
- forming a layer of lithographic material over said array of field emission microtips;
- forming openings in said layer of lithographic material;
- forming a layer of non-outgassing material over the surface of said layer of lithographic material, including in said openings;
- filling said openings with a non-outgassing spacer material;
- and
- removing said layer of lithographic material and said layer of non-outgassing material.
A method of fabricating a field emission display having high aspect ratio spacers, comprising the steps of:
- forming an array of field emission microtips over a substrate;
- forming a layer of lithographic material over said array of field emission microtips;
- forming openings in said layer of lithographic material;
- forming a non-outgassing material over surface of said layer of lithographic material, including in said openings;
- forming a layer of conductive spacer material in said openings;
- and
- removing said layer of lithographic material and said non-outgassing material.
A method of fabricating a field emission display having high aspect ratio spacers, comprising the steps of:
- forming an array of field emission microtips over a substrate;
- forming a layer of lithographic material over said array of field emission microtips;
- forming openings in said layer of lithographic material;
- forming a non-outgassing material over surface of said layer of lithographic material, including in said openings;
- filling said openings and covering said layer of lithographic material with a dielectric paste;
- removing said dielectric paste in the region over said layer of lithographic material, by chemical mechanical polishing;
- and
- removing said layer of lithographic material and said non-outgassing material.
Dependencies are inferred from the claim text.