Vacuum processing apparatus
AssigneesTokyo Electron Limited, Tokyo Electron Yamanashi Limited
InventorTutomu Hiroki
Life of this patent
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Abstract
A vacuum processing apparatus in which LCD substrates are processed includes three process chambers. Each of the process chambers is connected to a first load lock chamber through a gate valve. A second load lock chamber is also connected to the first load lock chamber through a gate valve. The second load lock chamber is opposed to a carrier member, which is arranged in the atmosphere, through a gate valve. A carrier arm is arranged in the first load lock chamber to carry the substrates between each of the process chambers and the second load lock chamber. A buffer rack for supporting two substrates thereon and positioners for aligning the two substrates, which are supported on the buffer rack, simultaneously are arranged in the second load lock chamber.
Claims23
A vacuum processing apparatus comprising:
- a process chamber in which a substrate is processed under a vacuum atmosphere;
- a first load lock chamber connected to the process chamber through a first gate valve;
- a second load lock chamber connected to the first load lock chamber through a second gate valve;
- a first transfer mechanism arranged in the first load lock chamber which transfers the substrate between the process chamber and the second load lock chamber through the first load lock chamber;
- a buffer rack arranged in the second load lock chamber to stack a plurality of substrates with an interval interposed between two adjacent substrates;
- a positioning mechanism arranged in the second load lock chamber, said positioning mechanism simultaneously aligning the substrates supported on the buffer rack;
- a table upon which a cassette is mounted in which a plurality of the substrates are stacked with an interval interposed between two adjacent substrates;
- and
- a second transfer mechanism transferring the substrates between the cassette mounted on the table and the buffer rack,
- wherein each of the substrates has a rectangular shape and the positioning mechanism includes first and second positioners movable relative to each other in a diagonal direction of the substrates to sandwich the substrates between the first and second positioners, and
- wherein the second transfer mechanism supports and transfers the substrates, which are supported together on the buffer rack, simultaneously with an interval interposed between two adjacent substrates.
A vacuum processing apparatus comprising:
- first and second process chambers in each of which a substrate to be processed is positioned, said substrate having a rectangular shape, wherein said substrate is processed under a vacuum atmosphere;
- a first load lock chamber having a gate valve connected to each of the first and second process chambers;
- a second load lock chamber having a gate valve connected to the first load lock chamber;
- a first transfer mechanism arranged in the first load lock chamber, said first transfer mechanism transferring substrates located therein between the process chambers and the second load lock chamber through the first load lock chamber;
- a buffer rack arranged in the second load lock chamber, said buffer rack stacking substrates located therein with an interval interposed between two adjacent substrates;
- a positioning mechanism located in the second load lock chamber, said positioning mechanism aligning each of the substrates supported on the buffer rack simultaneously, the positioning mechanism having first and second positioners movable relative to each other in a diagonal direction of the substrates to sandwich the substrates therebetween;
- a table upon which a cassette is mounted in which substrates located therein are stacked with an interval interposed between two adjacent substrates;
- and
- a second transfer mechanism transferring the substrates between the cassette mounted on the table and the buffer rack, the second transfer mechanism supporting and transferring the substrates, which are supported together on the buffer rack, simultaneously with an interval interposed between two adjacent substrates.
A vacuum processing apparatus comprising:
- a process chamber in which a substrate to be processed, having a rectangular shape, is processed under a vacuum atmosphere;
- a first load lock chamber having a first gate valve connected to the process chamber;
- a second load lock chamber having a second gate valve connected to the first load lock chamber;
- a first transfer mechanism arranged in the first load lock chamber and transferring substrates located therein between the process chamber and the second load lock chamber through the first load lock chamber;
- a buffer rack arranged in the second load lock chamber, said buffer rack stacking two or more substrates located therein with an interval interposed between two adjacent substrates;
- a positioning mechanism arranged in the second load lock chamber and aligning the substrates supported on the buffer rack simultaneously, the positioning mechanism having first and second positioners movable relative to each other in a diagonal direction of the substrates to sandwich the substrates therebetween;
- a table upon which a cassette is mounted in which a plurality of substrates are stacked with an interval interposed between two adjacent substrates;
- and
- a second transfer mechanism arranged in the second load lock chamber wherein a gate valve is provided on the second load lock chamber and interposed between the second transfer mechanism and the table, said second transfer mechanism transferring substrates between the cassette mounted on the table and the buffer rack, the second transfer mechanism supporting and transferring the substrates, which are supported together on the buffer rack, simultaneously with an interval interposed between two adjacent substrates.
The apparatus according to claim 34, wherein the first positioner includes a first pair of rollers contacting two adjacent sides of each substrate and a second positioner includes a second pair of rollers contacting two other adjacent sides of each substrate.
Dependencies are inferred from the claim text.