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US 5,508,518 AGranted
Lithography tool with vibration isolation
AssigneeInternational Business Machines Corporation
InventorRodney A. Kendall
Life of this patent
Estimating the term…
Abstract
The optical components of an imaging or exposure tool are isolated from vibrations emanating from components such as vacuum pumps, stage drives, and substrate translating and handling components, by connecting all sources of vibrations to the frame, and suspending the optical components from the frame using isolating and damping components. Connections to portions of the optical components are made using high vacuum, heavily damped, bellows type connectors, or the like.
Claims10
A particle beam lithography arrangement, comprising:
- a substrate handling module fixedly mounted on one side of a ground frame;
- a stage drive module fixedly mounted on another side of said ground frame;
- a particle beam exposure module suspended between said substrate handling module and said stage drive module;
- and
- means for dampening movement of said exposure module relative to said ground frame.
2 more elements
A lithography or inspection tool, comprising:
- a frame;
- an optical subsystem;
- a means for isolating said optical subsystem from vibrations emanating from said frame, said means for isolating vibrations being positioned between said frame and said optical subsystem;
- and
- at least one source of vibration connected to said frame, whereby vibrations from said source of vibration are isolated from said optical subsystem by said means for isolating.
2 more elements
Dependencies are inferred from the claim text.