Low temperature process for fabricating layered superlattice materialsand making electronic devices including same
AssigneesSymetrix Corporation, Olympus Optical Co., Ltd.
InventorsTakeshi Ito, Carlos A. Paz de Araujo, Hitoshi Watanabe, Michael C. Scott
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Abstract
A liquid precursor containing a metal is applied to a first electrode, RTP baked at a temperature of 700.degree. C., and annealed at the same temperature for from 3 to 5 hours to form a layered superlattice material. A second electrode is formed to form a capacitor, and a second anneal is performed at a temperature of 700.degree. C. If the material is strontium bismuth tantalate, the precursor contains u mole-equivalents of strontium, v mole-equivalents of bismuth, and w mole-equivalents of tantalum, where 0.8.ltoreq.u.ltoreq.1.0, 2.0 v.ltoreq.2.3, and 1.9.ltoreq.w.ltoreq.2.1.
Claims30
A method of fabricating a layered superlattice material comprising:
- providing a substrate, and a precursor containing metal moieties in effective amounts for spontaneously forming a layered superlattice material upon heating said precursor;
- applying said precursor to said substrate;
- and
- heating said precursor on said substrate to a temperature of between 600.degree. C. and 700.degree. C. to form said layered superlattice material on said substrate.
A method of fabricating a layered superlattice material comprising:
- providing a substrate, and a precursor containing metal moieties in effective amounts for spontaneously forming a layered superlattice material upon drying and annealing said precursor;
- applying said precursor to said substrate;
- drying said precursor to form a solid material on said substrate;
- and
- annealing said solid material at a temperature of between 600.degree. C. and 725.degree. C. to form said layered superlattice material on said substrate.
A method of fabricating layered superlattice material comprising:
- providing a substrate and a precursor containing metal moieties in effective amounts for spontaneously forming a layered superlattice material upon heating said precursor;
- forming an adhesion layer on said substrate;
- forming an electrode on said adhesion layer;
- applying said precursor to said substrate;
- and
- heating said precursor on said substrate to a temperature of about 700.degree. C. to form said layered supperlattice material on said substrate.
A method of fabricating a layered superlattice material comprising:
- providing a substrate, and a precursor containing u mole-equivalents of strontium, v mole-equivalents of bismuth, and w mole-equivalents of tantalum, where 0.8.ltoreq.u.ltoreq.1.0, 2.0.ltoreq.v.ltoreq.2.3, and 1.9.ltoreq.w.ltoreq.2.1;
- applying said precursor to said substrate;
- and
- heating said precursor on said substrate to form a thin film of strontium bismuth tantalate on said substrate.
Dependencies are inferred from the claim text.