Photographic silver halide photosensitive material
AssigneeFuji Photo Film Co., Ltd.
InventorsKiyoteru Miyake, Takashi Kato, Yoshio Inagaki
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Abstract
A photographic silver halide photosensitive material includes an infrared sensitive layer which is spectrally sensitized with a combination of at least two J-band type sensitizing dyes so as to have maximum spectral sensitivity at 700 nm or longer wavelength. The photosensitive material has high sensitivity to exposure to a semiconductor laser of 700 nm or longer wavelength. Color separation is improved in the case of color photosensitive material.
Claims4
A photographic silver halide material comprising at least one infrared sensitive silver halide emulsion layer containing a silver halide emulsion which is spectrally sensitized with a combination of at least two J-band type sensitizing dyes so as to have maximum spectral sensitivity at a wavelength of at least 700 nm;
- wherein the combination of at least two J-band type sensitizing dyes is a combination of at least one compound of formula (DI);
- wherein R.sup.1 and R.sup.2 each independently are --C.sub.2 H.sub.5, --C.sub.2 H.sub.4 OCH.sub.3, --C.sub.2 H.sub.4 O(C.sub.6 H.sub.11) or --(CH.sub.2).sub.3 SO.sub.3 ;
- R.sup.5 is --H, --CH.sub.3 or --C.sub.2 H.sub.5 ;
- V.sup.1 is a phenyl radical, a chlorophenyl radical, a naphthyl radical or a pyridine radical;
- X.sup.1 is --H, --OCH.sub.3, --OC.sub.2 H.sub.5 or --Cl;
- M.sup.1 is I.sup.-, Br.sup.-, Na.sup.+, ClO.sub.4.sup.-, NH(C.sub.2 H.sub.5) or CH.sub.3 (C.sub.6 H.sub.10)SO.sub.3 ;
- and
- m.sup.1 is 0 or 1;
- and at least one compound of formula (DII):
- ##STR43## wherein R.sup.11 and R.sup.12 each independently are --C.sub.2 H.sub.5, --C.sub.2 H.sub.4 OCH.sub.3, --C.sub.2 H.sub.4 O(C.sub.6 H.sub.11) or --(CH.sub.2).sub.3 SO.sub.3.sup.- ;
- R.sup.13 is --H or --CH.sub.3 ;
- R.sup.14 is --CH.sub.3, --C.sub.2 H.sub.5 or a phenyl radical, provided that R.sup.14 is --CH.sub.3 or --C.sub.2 H.sub.5 when R.sup.13 is --H;
- R.sup.15 is --H , --CH.sub.3, --C.sub.2 H.sub.5 or a phenyl radical;
- X.sup.11 is --H, --OCH.sub.3, --OC.sub.2 H.sub.5 or --Cl;
- M.sup.11 is Cl.sup.-, Br.sup.-, I.sup.-, Na.sup.+, ClO.sub.4.sup.-, a p-toluene-sulfate ion, NH(C.sub.2 H.sub.5).sub.3.sup.+ or CH.sub.3 (C.sub.6 H.sub.10)SO.sub.3 ;
- and
- m.sup.11 is 0 or 1;
- and
- wherein the molar ratio of the compound of formula (DII) to the compound of formula (DI) is from 0.05 to 0.75.
Dependencies are inferred from the claim text.