Process for fabricating a device

A process for fabricating a device comprising:

• applying an imaging layer comprising an energy sensitive polymeric material onto a substrate;
• exposing the imaging layer to radiation to form a first discrete area on the imaging layer in which the polymeric material has moieties pendant thereto which are susceptible to binding a refractory material and a second discrete region in the imaging layer in which the polymeric material contains significantly fewer of the moieties that are susceptible to binding a refractory material, the first discrete region and the second discrete region together defining a pattern;
• contacting a first reagent containing the refractory material with the imaging layer thereby directly binding the refractory material to at least a portion of the moieties susceptible to binding the refractory material, thereby introducing the desired selectivity into the resist;
• developing the pattern in the imaging layer from the image defined by the first and second discrete regions;
• and
• transferring the pattern in the imaging layer into the substrate.