Method of manufacturing a capacitance sensor
AssigneeMatsushita Electric Industrial Co., Ltd.
InventorsShigenori Hayashi, Takeshi Kamada, Hideo Torii, Takashi Hirao
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AssigneeMatsushita Electric Industrial Co., Ltd.
InventorsShigenori Hayashi, Takeshi Kamada, Hideo Torii, Takashi Hirao
Estimating the term…
A small and highly sensitive capacitance type pressure sensor is obtained by filling an alkali halide material such as KBr into a through-hole, forming a conductive thin film on the surface, and dissolving and removing the alkali halide material. An insulating plate disposed with a through-hole in the thickness direction is filled with a molten alkali halide material such as KBr. After forming a conductive thin film on the surface of the alkali halide material filled into the through-hole and the vicinity thereof, the alkali halide material is dissolved by water and removed. In this way, a diaphragm is made of the through-hole and the conductive thin film. A curve of the diaphragm caused by a pressure difference between the both faces of the conductive thin film is detected as a capacitance change between the conductive thin film and the electrode layer.
A method of manufacturing a capacitance sensor comprising an insulating plate having a through-hole in the thickness direction, a conductive thin film disposed on a top surface of the insulating plate covering the through-hole, an electrode layer disposed on a bottom surface of the insulating plate covering at least the through-hole, and a base material which holds the insulating plate together with the electrode layer, comprising the steps of:
Dependencies are inferred from the claim text.